SEMATECH at SPIE

Dozens of papers highlighting SEMATECH research will be featured this year at the SPIE Advanced Lithography Conference on February 21-25 in San Jose, CA.

In addition, SEMATECH will host a number of technical and working group meetings during the conference.

SEMATECH Research

Papers authored or co-authored by SEMATECH researchers, or highlighting SEMATECH research include:

Extreme Ultraviolet (EUV) Lithography

Debris measurement at the intermediate focus of a laser-assisted discharge-produced plasma light source
Wednesday, 24 February 2010 | 10:50 AM – 11:10 AM
The SEMATECH Berkeley MET pushing EUV development beyond 22-nm half pitch
Thursday, 25 February 2010 | 10:30 AM – 10:50 AM
An inspection and defect review strategy for EUV pilot line and high-volume manufacturing
Wednesday, 24 February 2010 | 4:50 PM – 5:10 PM
Determining the binding energy of contaminating molecules on capping layer materials of extreme-ultraviolet optics by density functional theory
Wednesday, 24 February 2010 | 6:00 PM
Modeling carbonization of extreme-ultraviolet optics
Wednesday, 24 February 2010 | 6:00 PM
Characterization of contamination on the illumination optics of the SEMATECH extreme-ultraviolet micro-field exposure tool
Wednesday, 24 February 2010 | 6:00 PM
Deposition strategy to achieve near defect-free EUVL mask blanks
Wednesday, 24 February 2010 | 6:00 PM
Particle protection capability of SEMI compliant EUV dual pod
Wednesday, 24 February 2010 | 6:00 PM
E-beam correction methodology for compensation of mask nonflatness in EUVL pilot line
Wednesday, 24 February 2010 | 8:40 AM – 9:00 AM
Particle removal challenges of EUV patterned masks for the sub-22-nm HP node
Tuesday, 23 February 2010 | 3:00 PM – 3:20 PM
MOSAIC: revisited, reformulated, and NA independent
Wednesday, 24 February 2010 | 2:20 PM – 2:40 PM
Characterization of promising resist platforms for sub-30-nm HP manufacturability and EUV-CAR extendibility study
Monday, 22 February 2010 | 2:50 PM – 3:30 PM
Thin EUV resist and underlayer stacks: correlating Tg, surface polarity, density, and image quality
Monday, 22 February 2010 | 5:40 PM – 6:00 PM
Carbon contamination topography analysis of EUV masks
Tuesday, 23 February 2010 | 11:10 AM – 11:30 AM
A study of defects on EUV mask using blank inspection, patterned mask inspection, and wafer inspection
Tuesday, 23 February 2010 | 2:00 PM – 2:20 PM

Alternative Lithographic Technologies

Nanoimprint at SEMATECH: program update and an assessment of the technology for semiconductor device applications
Tuesday, 23 February 2010 | 10:50 AM – 11:10 AM

Metrology, Inspection, and Process Control for Microlithography

The limits and extensibility of optical patterned defect inspection
Tuesday, 23 February 2010 | 8:40 AM – 9:00 AM
LER/LWR detection using dark-field spectroscopic methods
Tuesday, 23 February 2010 | 11:10 AM – 11:30 AM
CD-SEM utility with double patterning
Tuesday, 23 February 2010 | 6:00 PM
Electron-beam-induced photoresist shrinkage influence on 2D profiles
Thursday, 25 February 2010 | 8:30 AM – 8:50 AM
Reconstruct FinFET cross section using CD-SAXS
Tuesday, 23 February 2010 | 6:00 PM

Advances in Resist Materials and Processing Technology

Thin EUV resist and underlayer stacks: correlating Tg, surface polarity, density, and image quality
Monday, 22 February 2010 | 5:40 PM – 6:00 PM
Development of an inorganic-based photoresist for DUV, EUV, and e-beam imaging
Tuesday, 23 February 2010 | 8:40 AM – 9:00 AM
193-nm non-CA and low-CA resist systems for reducing LER
Tuesday, 23 February 2010 | 6:00 PM
Nonchemically amplified resists for 193-nm immersion lithography: influence of absorbance on performance
Tuesday, 23 February 2010 | 6:00 PM

Related Meetings

All meeting rooms in Hilton San Jose

IEUVI Mask TWG
Room: San Carlos
Sunday, February 21 | 9:00 AM - 12:00 PM
View a PDF of the meeting agenda
For more information contact: David Chan

SEMATECH RMAG Meeting (invitation only)
Room: University
Sunday, February 21 | 10:00 AM - 12:00 PM

IEUVI Resist TWG
Room: San Carlos
Sunday, February 21 | 1:00 PM - 4:00 PM
View a PDF of the meeting agenda
For more information contact: Jacque Georger

SEMATECH MASC Meeting (invitation only)
Room: University
View a PDF of the meeting agenda
Sunday, February 21 | 1:00 PM - 5:00 PM

Litho Forum Steering Committee Meeting (invitation only)
Room: Pacific
Monday, February 22 | 7:00 AM - 8:00 AM

EUVL Symposium Steering Committee Meeting (invitation only)
Room: Plaza
Wednesday, February 24 | 7:00 AM - 8:00 AM

Lithography Extensions Steering Committee Meeting (invitation only)
Room: University
Thursday, February 25 | 7:00 AM - 8:00 AM

EMI BWG Meeting (invitation only)
Room: Santa Clara
Thursday, February 25 - 9:00 AM - 11:00 AM

IEUVI Source TWG (invitation only)
Room: Market
View a PDF of the meeting agenda
Thursday, February 25 | 1:00 PM - 3:00 PM

IEUVI Board Meeting (invitation only)
Room: Market
Thursday, February 25 | 4:00 PM - 6:30 PM