SEMATECH News

23 Apr 08

SEMATECH’S Litho Forum Spotlights High-Stakes Shift to Next-Generation Manufacturing

21 Apr 08

SEMATECH Researchers Demonstrate High-k Metal Gates for 22 nm Node and Advancements Resulting in Practical FinFETs and High Mobility Ge Channels

26 Mar 08

SEMATECH Lithography Forum to Focus on Major Technology Shift

27 Feb 08

Accretech Joins SEMATECH’s 3D Interconnect Program at UAlbany NanoCollege

25 Feb 08

Carl Zeiss and SEMATECH Develop Novel Design for Photomask Registration and Overlay Metrology to Enable Double-Patterning Lithography

21 Feb 08

SEMATECH and ISMI to Focus on Manufacturability at SPIE

20 Feb 08

Rudolph Joins Leading Chipmakers in SEMATECH’s Metrology Program at UAlbany NanoCollege

11 Feb 08

SEMATECH Achieves Single Digit EUV Mask Blank Defect Goal

22 Jan 08

SEMATECH Announces 2008 SEMATECH Knowledge Series

15 Jan 08

ISMI Introduces Guidelines to Protect IP in Semiconductor Industry