In the News
Developers Call for Backing of High-Index Immersion Lithography
Semiconductor International, 10 Oct 2007
High-k ‘Paradigm Shift’ Moves Forward
Semiconductor International, 27 Sep 2007
FinFETs: Challenges in Material and Processing for a New 3D Device Paradigm
Future Fab International, 09 July 2007
Through Silicon Vias: Building a Bridge Between Fab and Packaging, and Paving the Road(map)
Future Fab International, 09 July 2007
High Index Immersion: A Question of Materials Development
Future Fab International, 09 July 2007
Sematech expands immersion funding
EE Times, 04 May 2007
Current Trends in Semiconductor Research: Interview with SEMATECH CEO Mike Polcari
VLSI Research, 25 Apr 2007
Veeco Selected by SEMATECH for $2.4 Million EUV Lithography Tool Development Project
Nanotechwire, 24 Apr 2007
Veeco receives further funding from SEMATECH for EUV mask tools
Fabtech, 23 Apr 2007
SEMATECH successful in removing 10nm particles from EUV mask blanks
Fabtech, 12 Apr 2007
Sematech cleans 10-nm defects on EUV mask blanks
EDN, 11 Apr 2007
Sematech North researchers make advances in EUV lithography
Albany Times-Union, 11 Apr 2007
ATDF and ACC seek recruits for nanotechnology internship
Semiconductor FabTech, 15 Feb 2007
Austin American-Statesman, 11 Feb 2007
Sematech to advance planar solution devt for 22nm
Electronic Engineering Times, 09 Feb 2007
Cost-saving method fixes process variation in fab tools
Reliable Plant, 07 Feb 2007
New Cost-Saving Method For Correcting Process Variation
Industry week, 08 Feb 2007
Sematech, TEL advance work on 3D interconnects
Electronic Engineering Times, 31 Jan 2007
Sematech unveils solution for high-k CMOS devices
Electronic Engineering Times, 30 Jan 2007
nMOS transistor breakthrough touted by Intel, IBM & SEMATECH
Semiconductor Fabtech, 29 Jan 2007
SEMATECH Develops Dual Metal Gates For high-k CMOS Devices
Semiconductor Online, 29 Jan 2007
Tokyo Electron links up with Sematech
Austin Business Journal, 26 Jan 2007
SEMATECH opens doors to R&D collaboration with equipment suppliers; TEL in first
Semiconductor Fabtech, 26 Jan 2007
Sematech, TEL explore 3-D technology
EE Times, 25 Jan 2007
Sitaram Arkalgud becomes director of 3D interconnect program at SEMATECH
Semiconductor Fabtech, 04 Jan 2007
ISMI Updates Goals, Challenges of 450 mm Wafers
Semiconductor International, 01 Jan 2007
Metrology Meets Next-Generation Challenges — Barely
Semiconductor International, 01 Jan 2007
NanoTech Wire, 12 Dec 2006
Austin American-Statesman, 11 Dec 2006
VESTA Technology receives ALD order from major Japanese IDM
SEMICONDUCTOR FabTech, 04 Dec 2006
SEMATECH-led Workshops Scope Progress & Challenges for EUV Manufacturing
SOCcentral, 24 Nov 2006
Texas Inventors Develop Immersion Lithography Fluid Handling Method
Semiconductor International, 08 Nov 2006
Chip Industry Driven to Innovate, SEMATECH Chairman Tells ISMI Symposium
Semiconductor International, 11 Oct 2006
FUSI in doubt as viable gate stack technology, says SEMATECH
Semiconductor Fabtech, 05 Oct 2006
SEMATECH advances immersion lithography for 45nm processing
Small Times, 05 Oct 2006
FUSI in doubt as viable gate stack technology, says SEMATECH
FabTech, 05 Oct 2006
Semiconductor International, 04 Oct 2006
Sematech, SEMI to assess 450-mm efforts
EE Times, 27 Sep 2006
ASML, Sematech team on manufacturing R&D
EE Times, 19 Sep 2006
ASML to Deliver Advanced Resolution Techniques to SEMATECH for Manufacturing Research
Semiconductor International, 19 Sep 2006
EE Times, 21 Aug 2006
Next generation manufacturing: the contenders
Small Times, July/August 2006
NEC joins Sematech's manufacturing club
EE Times, 25 July 2006
Sematech Details High-k Metal Gate Advances
Electronic News, 14 Jun 2006
Forum attedees say litho on course with ITRS
EE Times, 25 May 2006
Search for better immersion photoresists goes down under
Semiconductor FABTECH, 25 May 2006
Semiconductor International, 15 May 2006
Lercel to lead Sematech litho group
EE Times, 04 May 2006
ATDF Developing Transistor Tech for UMC
Electronics News, 02 May 2006
UMC teams with ATDF on transistor development
Semiconductor FabTech, 02 May 2006
Sematech, UMC to devise next-gen ICs
EE Times, 02 May 2006
Sematech to Research Germanium
Semiconductor International, 01 May 2006
Future CD-SEM Calibration Standard Develops
Semiconductor International, 01 May 2006
Debate rages over 450-mm wafer fabs
EE Times, 28 Apr 2006
Nanoelectronics training program set up by SEMATECH
Semiconductor FabTech, 19 Apr 2006
ACC joins Sematech to foster new field
Austin American-Statesman, 18 Apr 2006
ATDF to research FinFET memories for Elpida
EE Times, 06 Apr 2006
Renesas Joins Sematech's Manufacturing Consortium
Electronic News, 03 Apr 2006
Renesas joins ISMI on back of benchmarking capabilities
Semiconductor Fabtech, 03 Apr 2006