SEMATECH Announces Keynote and Plenary Speakers for 2011 International Lithography Symposia
Leading lithographers from North America, Asia and Europe will gather to discuss potential solutions to critical technical issues on bringing extreme ultraviolet lithography into high-volume manufacturing
MIAMI (September 26, 2011) –SEMATECH announced today that Jia Li of NVIDIA, Han-ku Cho of Samsung Electronics, and Risto Puhakka of VLSI will address top lithography technologists at the 2011 International Symposia on Extreme Ultraviolet Lithography (EUVL) and Lithography Extensions which takes place October 17-21 at Miami’s JW Marriott Marquis Hotel. The EUVL event is organized by SEMATECH, in cooperation with EIDEC and IMEC, and the Lithography Extensions Symposium is in cooperation with IMEC.
Lithography is the primary enabling technology for semiconductor manufacturing. By providing the capability to continuously reduce the size of features patterned on semiconductor wafers, each new generation of lithography equipment has enabled faster microprocessors and smaller, less costly integrated circuits. Without the continuous improvements in lithography process and equipment technology that have occurred over the past 45 years, personal computers, cell phones and the Internet would not be available today.
Dr. Jia Li, director of wafer foundry operations at NVIDIA, the world leader in visual and parallel computing technologies, will serve as plenary speaker. He has worked for more than 20 years in silicon process R&D and chip manufacturing, with experience in DRAM, SRAM, and logic products made with process technologies ranging from 1.2 um to 28 nm. He previously held technical and managerial positions at SGS-Thomson Microelectronics, Sony, Bell Labs, WaferTech, and Maxim Integrated Products. He and his team are evaluating 20 nm and 14 nm process technologies, including the readiness of EUV for and the extendability of 193 nm immersion lithography to the 14 nm node, and the impact of these technologies to the performance, reliability and die cost of NVIDIA’s GPU and SOC products.
Dr. Li’s topic, “Transform Designs to Chips with Sub-20 nm Technologies,” will focus on the technology and business needs which challenge lithography capabilities, including critical dimension/line-edge roughness (LER) control, defect elimination and throughput. As an end user, Dr. Li intends to discuss the impact of future lithography technologies such as extreme ultraviolet (EUV) on the design and manufacturing of new products. He will conclude with how EUV can provide three P's (performance, precision and perfection) in technology and one P (pricing) in business, for the continuation of Moore's Law beyond the 20 nm node.
Dr. Li’s plenary address will take place on Monday, October 17, 2011 at 8:15 a.m.
Dr. Han-ku Cho, vice president and head of the Photomask Team at Samsung Electronics, is the keynote speaker at the 2011 International Symposium on Extreme Ultraviolet Lithography. Dr. Cho has over 16 years of experience in the areas of lithography and photomask. He joined Samsung’s Electronics Semiconductor Business in 1995 and has served as vice president and director since 2007, in charge of production, management, and technology development of the Photomask Team, Semiconductor R&D Center. Dr. Cho has led the Korean government program in EUV lithography for nine years.
Dr. Cho’s topic, “EUV Readiness and ASML NXE3100 Performance,” will look at the current status and readiness of EUVL as well as the EUV mask fabrication process from the viewpoint of a device manufacturer. He will include imaging performance and issues related to the NXE3100, the world's first pre-production EUV lithography tool, as well as achievements and prospects in EUV resist development focused on line width roughness reduction.
Dr. Cho’s keynote address will take place on Wednesday, October 19, 2011 at 8:00 a.m.
Mr. Risto Puhakka, president of VLSI Research, Inc., is the keynote speaker at the 2011 International Symposium on Lithography Extensions. As president, Mr. Puhakka oversees and contributes to ongoing research projects and also spearheads product launches. He manages VLSI’s advisory activities and regularly supplies advice and analysis to leading companies in the chip making industry, the financial community and the press, as well as various government agencies. Since joining VLSI in 1995, Mr. Puhakka has been an important contributor to VLSI’s success. Starting as a senior analyst in Chip Making Markets, he has expanded his role through all critical positions within the company.
Mr. Puhakka’s topic, “The Business of Commercializing Innovation,” will explore the conditions that enable innovative lithography technologies to be introduced into mainstream semiconductor manufacturing.
Mr. Puhakka’s keynote address will take place on Thursday, October 20, 2011 at 8:10 a.m.
“We’re extremely honored to have Jia Li as this year’s plenary speaker and Han-ku Cho and Risto Puhakka as our keynote speakers,” said Stefan Wurm, associate director of lithography at SEMATECH. “We are looking forward to having them speak to symposia attendees and share their experiences on the status of EUV technology and key technical challenges in an effort to guide ongoing R&D within the industry.”
Registration for the 2011 International Symposia on Extreme Ultraviolet Lithography and Lithography Extensions is now open. See SEMATECH's upcoming meetings for more information.
About the Symposium on Extreme Ultraviolet Lithography
Organized by SEMATECH in cooperation with EIDEC and IMEC, the EUVL Symposium is part of SEMATECH’s ongoing commitment to help mature the technology and infrastructure for EUVL, including sources, masks, optics, resists, contamination control and metrology to support EUVL pilot line manufacturing requirements.
About the Symposium on Lithography Extensions
The Lithography Extensions Symposium focuses on efforts to extend lithographic patterning beyond the 15 nm half-pitch node. The primary emphasis will be placed on innovative patterning processes, emerging technologies and on techniques for improving process control. The symposium is hosted by SEMATECH in collaboration with IMEC and co-located with the EUVL Symposium.