SEMATECH research performed by SEMATECH
direct hire employees and member company assignees, and by universities
and national labs has resulted in the following patents. These patents
may be owned by the various entities doing the research, but are
owned by or licensed to SEMATECH and all of its member
companies.
Patents owned by SEMATECH are available for license
to third parties. For more information, contact the SEMATECH Law Department at (512)356-3412 or send an e-mail message
to law.department@sematech.org.
| Patent Number |
Title |
Date Issued |
| 6100184 |
Method of making a Dual Damascene Interconnect Structure Using Low Dielectric Constant Material for an Inter-level Dielectric Layer |
08-Aug-00 |
| 6037664 |
Dual Damascene Interconnect Structure Using Low Dielectric Constant Materials for an Inter-level dielectric layer |
14-Mar-00 |
| 5959348 |
Construction of PBGA Substrate for Flip Chip Packing |
28-Sep-99 |
| 5891513 |
Electroless Cu Deposition on a Barrier Layer by Cu Contact Displacement for ULSI Applications |
6-Apr-99 |
| 5881208 |
Heater and Temperature Sensor Array For Rapid Thermal Processing Thermal Core |
9-Mar-99 |
| 5866031 |
Slurry Formulation for Chemical Mechanical Polishing of Metals |
2-Feb-99 |
| 5867020 |
Capacitively Coupled RF Voltage Probe Having Optimized Flux Linkage |
2-Feb-99 |
| 5846398 |
CMP Slurry Measurement and Control Technique |
8-Dec-98 |
| 5840629 |
Copper Chemical Mechanical Polishing Slurry Utilizing a Chromate Oxidant |
24-Nov-98 |
| 5834931 |
RF Current Sensor |
10-Nov-98 |
| 5830805 |
Electroless Deposition Equipment or Apparatus and Method of Performing Electroless Deposition |
3-Nov-98 |
| 5824599 |
Protected Encapsulation of Catalytic Layer for Electroless Copper Interconnect |
20-Oct-98 |
| 5770982 |
Self Isolating High Frequency Saturable Reactor |
23-Jul-98 |
| 5783497 |
Forced-Flow Wafer Polisher |
21-Jul-98 |
| 5736457 |
Method of Making a Damascene Metallization |
7-Apr-98 |
| 5695810 |
Use of Cobalt Tungsten Phosphide as a Barrier Material for Copper Metallization |
9-Dec-97 |
| 5675403 |
Stress-free Mount for Imaging Mask |
7-Oct-97 |
| 5674652 |
Diffracted Light from Latent Images in Photoresist for Exposure Control |
7-Oct-97 |
| 5674787 |
Selective Electroless Copper Deposited Interconnect Plugs for ULSI Applications |
7-Oct-97 |
| 5665656 |
Method and Apparatus for Polishing a Semiconductor Substrate Wafer |
9-Sep-97 |
| 5622608 |
Process of Making Oxidation Resistant High Conductivity Copper Layers |
22-Apr-97 |
| 5660706 |
Electric Field Initiated Electroless Metal Deposition |
26-Aug-97 |
| 5635333 |
Antireflective Coating Process |
3-Jun-97 |
| 5614444 |
Method of Using Additives with Silica-Based Slurries to Enhance Selectivity in Metal CMP |
25-Mar-97 |
| 5589422 |
Controlled, Gas Phase Process for Removal of Trace Metal Contamination and for Removal of a Semiconductor Layer |
31-Dec-96 |
| 5587038 |
Apparatus and Process for Producing High Density Axially Extended Plasmas |
24-Dec-96 |
| 5572398 |
Tri-Polar Electrostatic Chuck |
5-Nov-96 |
| 5562530 |
Pulsed-Force Chemical Mechanical Polishing |
8-Oct-96 |
| 5555902 |
Submicron Particle Removal Using Liquid Nitrogen |
17-Sep-96 |
| 5541436 |
MOS Transistor Having Improved Oxynitride Dielectric |
30-Jul-96 |
| 5536559 |
Stress-Free Mount for Imaging Lithography Masks |
16-Jul-96 |
| 5531900 |
Modification of Polyvinylidene Fluoride Membrane and Method of Filtering |
2-Jul-96 |
| 5508556 |
Leaded Semiconductor Device Having Accessible Power Supply Pad Terminals |
16-Apr-96 |
| 5504328 |
Endpoint Detection Utilizing Ultraviolet Mass Spectrometry |
2-Apr-96 |
| 5480747 |
Attenuated Phase Shifting Mask with Buried Absorbers |
2-Jan-96 |
| 5479340 |
Real Time Control of Plasma Etch Utilizing Multivariate Statistical Analysis |
26-Dec-95 |
| 5478435 |
Point of Use Slurry Dispensing System |
26-Dec-95 |
| 5474865 |
Globally Planarized Binary Optical Mask Using Buried Absorbers |
12-Dec-95 |
| 5472811 |
Phase Shifting Mask Structure with Multilayer Optical Coating for Improved Transmission |
5-Dec-95 |
| 5467013 |
Radio Frequency Monitor for Semiconductor Process Control |
14-Nov-95 |
| 5472561 |
Radio Frequency Monitor for Semiconductor Process Control |
5-Dec-95 |
| 5466991 |
Optimized ECR Plasma Apparatus with Varied Microwave Window Thickness |
14-Nov-95 |
| 5456758 |
Submicron Particle Removal Using Liquid Nitrogen |
10-Oct-95 |
| 5450205 |
Apparatus and Method for Real-Time Measurement of Thin Film Layer Thickness and Changes Thereof |
12-Sep-95 |
| 5439569 |
Concentration Measurement and Control of Hydrogen Peroxide and Acid/Base Component in a Semiconductor Bath |
8-Aug-95 |
| 5438204 |
Twin-Mask, and Method and System for Using Same to Pattern Microelectronic Substrates |
1-Aug-95 |
| 5432366 |
P-I-N MOSFET for ULSI Applications |
11-Jul-95 |
| 5426498 |
Method and Apparatus for Real-Time Speckle Interferometry for Strain or Displacement of an Object Surface |
20-Jun-95 |
| 5418885 |
Three-Zone Rapid Thermal Processing System Utilizing Wafer Edge Heating Means |
23-May-95 |
| 5418095 |
Method of Fabricating Phase Shifters with Absorbing/Attenuating Sidewalls Using an Additive Process |
23-May-95 |
| 5415835 |
Method for Fine-Line Interferometric Lithography |
16-May-95 |
| 5411824 |
Phase Shifting Mask Structure with Absorbing/Attenuating Sidewalls for Improved Imaging |
2-May-95 |
| 5410256 |
Dissipation Factor as a Predictor of Anodic Coating Performance |
25-Apr-95 |
| 5397720 |
Method of Making MOS Transistor Having Improved Oxynitride Dielectric |
14-Mar-95 |
| 5436474 |
Modulation Doped Field Effect Transistor Having Built-In Drift Field |
7-Dec-94 |
| 5364510 |
Scheme for Bath Chemistry Measurement and Control for Improved Semiconductor Wet Processing |
15-Nov-94 |
| 5362606 |
Positive Resist Pattern Formation Through Focused Ion Beam Exposure and Surface Barrier Silylation |
8-Nov-94 |
| 5358740 |
Method for Low Pressure Spin Coating and Low Pressure Spin Coating Apparatus |
25-Oct-94 |
| 5352327 |
Reduced Temperature Suppression of Volatilization of Photoexcited Halogen Reaction Products from Surface of Silicon Wafer |
4-Oct-94 |
| 5344365 |
Integrated Building and Conveying Structure for Manufacturing Under Ultraclean Conditions |
6-Sep-94 |
| 5339039 |
Langmuir Probe System for Radio Frequence Excited Plasma Processing System |
16-Aug-94 |
| 5279865 |
High Throughput Interlevel Dielectric Gap Filling Process |
18-Jul-94 |
| 5326659 |
Method for Making Masks |
5-Jul-94 |
| 5324992 |
Self Timing Integrated Circuits Having Low Clock Signal During Inactive Periods |
28-Jun-94 |
| 5325019 |
Control of Plasma Process by Use of Harmonic Frequency Components of Voltage and Current |
28-Jun-94 |
| 5308742 |
Method of Anti-Reflection Coating |
3-May-94 |
| 5306985 |
ECR Apparatus with Magnetic Coil for Plasma Refractive Index Control |
26-Apr-94 |
| 5302356 |
Ultrapure Water Treatment System |
12-Apr-94 |
| 5302803 |
Apparatus and Method for Uniform Microwave Plasma Processing Using TE11 and TM01 Modes |
12-Apr-94 |
| 5302882 |
Low Pass Filter for Plasma Discharge |
12-Apr-94 |
| 5286678 |
Single Step Salicidation Process |
15-Feb-94 |
| 5284805 |
Rapid-Switching Rotating Disk Reactor |
8-Feb-94 |
| 5273610 |
Apparatus and Method for Determining Power in Plasma Processing |
28-Dec-93 |
| 5267019 |
Method and Apparatus for Reducing Fringe Interference in Laser Spectroscopy |
30-Nov-93 |
| 5264040 |
Rapid-Switching Rotating Disk Reactor |
23-Nov-93 |
| 5253324 |
Conical Rapid Thermal Processing Apparatus |
12-Oct-93 |
| 5233460 |
Method and Means for Reducing Speckle in Coherent Laser Pulses |
3-Aug-93 |
| 5216257 |
Method and Apparatus for Alignment and Overlay of Submicron Lithographic Features |
1-Jun-93 |
| 5237878 |
Apparatus and Method for Sampling Ultra-Pure Chemical |
24-Aug-93 |
| 5211729 |
Baffle/Settling Chamber for Chemical Vapor Deposition Equipment |
18-May-93 |
| 5196380 |
Reactive Membrane for Filtration and Purification of Gases of Impurities |
23-Mar-93 |
| 5186597 |
Apparatus for Servicing of Semiconductor Equipment |
16-Feb-93 |
| 5164790 |
Simple CD Measurement of Periodic Structures on Photomasks |
17-Nov-92 |
| 5159267 |
Pneumatic Energy Fluxmeter |
27-Oct-92 |
| 5159264 |
Pneumatic Energy Fluxmeter |
27-Oct-92 |
| 5155337 |
Method and Apparatus for Controlling Rapid Thermal Processing Systems |
13-Oct-92 |
| 5145493 |
Molecular Restricter |
8-Sep-92 |
| 5139925 |
Surface Barrier Silylation of Novolak Film Without Photoactive Additive Patterned with 193 nm Excimer Laser |
18-Aug-92 |
| 5126289 |
Semiconductor Lithography Methods Using an ARC of Organic Material |
30-Jun-92 |
| 5111111 |
Method and Apparatus for Coupling a Microwave Source in an Electron Cyclotron Resonance System |
5-May-92 |
| 5102816 |
Staircase Sidewall Spacer for Improved Source/Drain Architecture |
7-Apr-92 |
| 5089442 |
Silicon Dioxide Deposition Method Using a Magnetic Field and Both Sputter Deposition and Plasma Enhanced CVD |
18-Feb-92 |
| 5057185 |
Triode Plasma Reactor with Phase Modulated Plasma Control |
15-Oct-91 |
| 5056875 |
Container for Use Within a Clean Environment |
15-Oct-91 |
| 5013691 |
Anisotropic Deposition of Silicon Dioxide |
7-May-91 |
| 5062446 |
Intelligent Mass Flow Controller |
5-Nov-91 |
| 5178840 |
Single Wafer Regrowth of Silicon |
12-Jan-93 |
| 5133829 |
Single Wafer Regrowth of Silicon |
28-Jul-92 |
| 5161717 |
Spin Casting of Silicon Wafers |
10-Nov-92 |
| 5074421 |
Quartz Tube Storage Device |
24-Dec-91 |
| 4483737 |
Method and Apparatus for Plasma Etching a Substrate |
20-Nov-84 |
