SEMATECH DOC ID #: 97093364A-XFR

Title: Point-of-Use (POU) Control Systems for Semiconductor Process Emissions

Author(s): J. Michael Sherer;

Document date: 10/30/1997

Descriptor(s): point of use abatement;control systems;processes;

Abstract:  This report documents the results of a study of point-of-use (POU) control
systems used primarily for corrosive gases (hydrogen chloride, chlorine,
etc.), ammonia, silane, arsine, diborane, and phosphine. Perfluorocompounds
(PFC) and volatile organic compounds (VOCs) were not included. Three member
company facilities and four POU control system suppliers were visited to
gather information for creating supplier and member company surveys and to
review the different types of POU control system technologies and
sampling/analytical techniques used for demonstrating compound removal
efficiencies. Because only a few member company surveys were returned, their
data are not presented. A suggested list of POU technologies for each of 14
semiconductor process applications is included.

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