00063964A-ENG Abstract: Advanced Mask Modeling Accuracy and Stability Study-University of Wisconsin Mask Modeling

SEMATECH DOC ID #: 00063964A-ENG

Title: Advanced Mask Modeling Accuracy and Stability Study-University of Wisconsin Mask Modeling

Author(s): R. Scott Mackay;

Document date: 06/19/2000

Descriptor(s): finite element modeling;pattern generators;photomasks;

Abstract: This report presents progress on finite element (FE) modeling of the pattern
transfer process to investigate pattern-specific image displacement resulting
from mask manufacturing and application in a system for extreme ultraviolet
(EUV), scattering with aperture limited projection lithography (SCALPEL), and
157 nm optical lithography.

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