SEMATECH DOC ID #: 00073974A-TR

Title: Behavior of Fused Silica Under 193 nm Irradiation

Author(s): Chris Van Peski;

Document date: 07/27/2000

Descriptor(s): deep ultraviolet lithography;excimer lasers;lenses;lithography equipment;materials characterization;optical materials;

Abstract:  This report from the Optical Materials Characterization and Development
project (LITG201) describes a study of characteristics of fused silica for
use as lenses in exposure equipment. Samples from eight suppliers were
subjected to tens of billions of exposures of a 139 nm excimer laser at
various fluences to determine scaling laws for low fluence exposures. At 14
billion exposures, samples exhibited varying behavior. Some samples showed
densification; some showed rarefaction. No clear trends were observed at 14
billion exposures.

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