SEMATECH DOC ID #: 00073978A-ENG

Title: 157 nm University Resist Materials Research Project (LITJ102) Transparency Report

Author(s): Andrew Jamieson;Brian Trinque;C. Grant Willson;Colin Brodsky;HV Tran;Heather Johnson;Jeffrey Byers;Kyle Patterson;Mark Somervell;Raymond Hung;Shang-Ho Lin;Shintaro Yamada;Sungseo Cho;Takashi Chiba;Tony Vander Heyden;Will Conley;

Document date: 07/27/2000

Descriptor(s): absorption;ellipsometry;photoresists;polymers;resist modeling;spectrometry;ultraviolet lithography;

Abstract:  This document describes material transparency data collected to aid in the
design of a single layer resist for 157 nm. The resist has been conceptually
segmented into four functional modules, each of which must be transparent at
157 nm: an acidic group, an acid labile protecting group, an etch-resistant
moiety, and a polymer backbone. Progress has been made toward finding
candidate structures--acidic bis-trifluoromethylcarbinols, fluorine in
acrylates and alicyclics, esters of poly(a-trifluoromethylacrylic acid--for
each of these modules. The Diels Alder adducts derived from the reaction of
these and other fluorinated alkenes with cyclopentadiene offer a route to a
wide range of alicyclic monomers that show great promise as transparent, etch-
resistant platforms for the design of 157 nm resists.

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