SEMATECH DOC ID #: 00114031A-ENG

Title: 157 nm Resist Development Project (LITJ103) Year-End Report

Author(s): Kim Dean;

Document date: 11/30/2000

Descriptor(s): materials testing;lithography equipment;phase shifting masks;resists;outgassing;photoresists;

Abstract:  This report summarizes year 2000 activities of the LITJ103 project, 157 nm
Resist Development. The 157 nm Exitech exposure tool, resolution enhancement,
and outgassing projects are discussed. A list of presentations and the
procedure for submitting samples to the Resist Test Center (RTC) are included
in the appendices.

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