SEMATECH DOC ID #: 03074417A-ENG

Title: The OMAG3 Reticle Set

Author(s): Benjamin Bunday;Michael Bishop;Richard Silver;

Document date: 07/30/2003

Descriptor(s): overlay;masks;metrology;

Abstract:  The LITG440 project in collaboration with the National Institute
of Standards and Technology (NIST) has designed and built a
reticle set to facilitate development of diffraction,
scatterometry, scanning electron microscopy (SEM), and atomic
force microscopy (AFM) technology for overlay metrology. This
document summarizes the devices found on the reticle. It also
includes optical overlay targets for benchmarking, standards
development, and optimization studies.

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