SEMATECH DOC ID #: 03094436A-ENG

Title: Construction and Validation of an Angle-Resolved Scatterometer for Investigation of 157 nm Optical Materials

Author(s): T. M. Bloomstein;

Document date: 09/26/2003

Descriptor(s): scatterometers;extreme ultraviolet lithography;157 nm lithography;

Abstract:  This report from the LITJ210 project describes the design and
initial testing of an angle resolved scatterometer optimized for
near angle measurements. The system relies on a unique beam
apodization scheme using gas phase absorption to produce a
Gaussian pupil function. Initial results show two orders of
magnitude improvement over a previous design employing a uniform
pupil function. The background signature is approaching
sufficient levels to measure small angle scatter from high
quality EUV mirrors.

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