SEMATECH DOC ID #: 03114452B-ENG

Title: Charge Control During Photomask Critical Dimension (CD) Metrology

Author(s): David Joy;

Document date: 02/25/2004

Descriptor(s): scanning electron microscopes;critical dimension;masks;high vacuum;electron beam;

Abstract:  This report from the LITJ231 project discusses experiments to
control charging during critical dimension (CD) measurements of
advanced photomask structures and the development of an advanced
secondary electron detector for a low vacuum CD metrology tool.
This revision updates the sections about mask metrology in high
vacuum and in the presence of gas as well as enhancing
environmental scattered electron detectors (ESEDs).

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