SEMATECH DOC ID #: 03124475A-ENG

Title: Immersion Lithography Modeling 2003 Year-End Report

Author(s): Alexander Wei;Amr Abdo;Andrew Grenville;Edward Lovell;Gerald Dicks;Gregory Nellis;Jaehyuk Chang;Roxann Engelstad;Walter Trybula;

Document date: 12/12/2003

Descriptor(s): 193 nm lithography;process modeling;simulation;lenses;birefringence;immersion lithography;fluid flow;computational fluid dynamics;

Abstract:  This report from the LITH130 project summarizes the modeling and
experimental results of using immersion lithography for fluid
dispensing, fluid heating, fluid/structure interactions, wafer
topology, and shock loading effects at 193 nm.

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