SEMATECH DOC ID #: 04024494A-TR

Title: Extreme Ultraviolet (EUV) Source Metrology for EUV Source Development

Author(s): Steven Grantham;

Document date: 04/01/2004

Descriptor(s): extreme ultraviolet lithography;lasers;plasma;measuring instruments;calibration;

Abstract:  This report from the LITH150 project describes activities at the
National Institute of Standards and Technology (NIST) to
calibrate individual components of the Flying Circus (FC2)
metrology tool, including seven Zr-based filters, two Mo/Si
mirrors, and three extreme ultraviolet (EUV) detectors. The
accuracy of NIST's EUV detector calibrations was also improved by
implementing absolute cryogenic radiometer (ACR)-based
radiometric standards in the 13 nm wavelength regime. The effects
of pulse duration and intensity on the responsivity of EUV
detectors were also examined. Two methods were developed for
calibrating a fully assembled FC2 instrument: one based on a
synchrotron light source and another that incorporates a laser-
produced plasma (LPP) source.

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