04114596D-ENG Abstract: Unified Advanced Optical Critical Dimension (OCD) Scatterometry Specification for sub-65 nm Technology (2007 Version)

SEMATECH DOC ID #: 04114596D-ENG

Title: Unified Advanced Optical Critical Dimension (OCD) Scatterometry Specification for sub-65 nm Technology (2007 Version)

Author(s): Amir Azordegan;Benjamin Bunday;Bill Banke;Chas Archie;Eric Solecky;John Allgair;Richard Silver;

Document date: 01/15/2008

Descriptor(s): critical dimension;equipment specification;performance specification;scanning electron microscopes;scatterometers;

Abstract: This report from the LITG440M project (originally authored under
the SEMATECH LITG410 project) is a unified specification for
advanced optical critical dimension (OCD) scatterometry
measurement instruments developed by SEMATECH representatives.
This specification is intended for the scatterometry user and
supplier community as a whole. Its purpose is to specify member
companies' OCD tool requirements, set forth methodologies for
measuring various metrics for benchmarking and qualifying OCD
scatterometers, to drive suppliers to meet customers'
requirements and the ITRS. It is also a useful source for
developing in-house metrology practices, training new personnel,
and guiding the writing of acceptance specifications. This
specification is a "living document," designed for amendment to
address future technology nodes and issues. This version revises
throughput, discusses challenges to OCD posed by double
patterning and shifts in n & k optical properties, and includes
new material on fleet management and recipe portability, an
alternative method for concurrent measurement of spot size and
navigation, and a general discussion about uncertainty, including
sampling error.

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