SEMATECH DOC ID #: 05024630A-ENG

Title: Berkeley Extreme Ultraviolet Microexposure Tool 2004 Year-End Report

Author(s): Kim Dean;Patrick Naulleau;

Document date: 02/21/2005

Descriptor(s): extreme ultraviolet lithography;chemically amplified resists;equipment characterization;depth of focus;microexposure tools;

Abstract:  This 2004 report from the LITK102S (formerly LITK100) project
presents an overview of the micro exposure tool (MET) at Lawrence
Berkeley National Laboratory, including upgrades. Tool characterization
data, including dose and focus control, resolution limits, modulation
transfer function (MTF) measurements, and flare measurements, are also
included.

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