Metrology |
| Document # | Document Name | Publication Date |
| 04114595D-ENG |
Unified Advanced Critical Dimension Scanning Electron Microscope (CD-SEM) Specification for sub-90 nm Technology (2007 Version) |
01/15/2008 |
| 04114596D-ENG |
Unified Advanced Optical Critical Dimension (OCD) Scatterometry Specification for sub-65 nm Technology (2007 Version) |
01/15/2008 |
| 04024494A-TR |
Extreme Ultraviolet (EUV) Source Metrology for EUV Source Development |
04/01/2004 |
| 04024498A-TR |
Cross-Calibration of Extreme Ultraviolet (EUV) Energy Sensors |
04/01/2004 |
| 03114452B-ENG |
Charge Control During Photomask Critical Dimension (CD) Metrology |
02/25/2004 |
| 03094436A-ENG |
Construction and Validation of an Angle-Resolved Scatterometer for Investigation of 157 nm Optical Materials |
09/26/2003 |
| 03074417A-ENG |
The OMAG3 Reticle Set |
07/30/2003 |
| 01054118A-XFR |
Call for Improved Ultra-Low Background Alpha-Particle Emission Metrology for the Semiconductor Industry |
05/14/2001 |
| 00013877A-ENG |
Current State of Defect Review by Electron Beam Tools: A White Paper |
01/14/2000 |
| 99083800B-TR |
Advanced Particle Sizing Technique for Development of High-Accuracy Scanner Calibration Standards |
10/08/1999 |
| 96063138C-ENG |
Radio Frequency (RF) Measurement and Control Project Report (TECQ001) |
09/09/1998 |
| 94102578A-TR |
Metrology Roadmap: A Supplement to the National Technology Roadmap for Semiconductors |
02/09/1995 |
