SEMATECH Surface Preparation and Cleaning Conference
March 31 - April 2, 2008
Austin, Texas
“Emerging Technologies in Semiconductor Surface Preparation”
This conference—which brings together prominent researchers from the semiconductor industry and the university community—will focus on current developments and ITRS challenges in advanced wafer and mask cleaning and surface preparation technologies for the 32nm node and beyond.
Scope
The Surface Preparation and Cleaning Conference will focus on the needs and challenges in wafer and mask cleaning, including wafer front-end, wafer back-end, advanced mask, and environment, safety and health issues. Attendees can expect to gain a better understanding of the development of current and future technologies and solutions for advanced wafer and mask cleaning and surface preparation.
See Who's Speaking
Industry experts representing IC manufacturers, suppliers, and research organizations from around the globe will present the industry’s best available data on mask and wafer cleans.
Werner Kern and Karen Reinhardt will kick-off the SPCC with the conference keynote, "Milestones of Cleaning Technology" on Tuesday, April 1 at 9:15AM.
See Program Information for more details on other invited conference speakers.
Optional Training Course
"Basic and Advanced Topics of Surface Conditioning and Cleaning Processing for Integrated Circuit Manufacturing"
March 31, 8AM-5PM
This full-day optional training course is being offered in conjunction with the Surface Preparation and Cleaning Conference. Course attendees can expect to gain a greater understanding of the practical applications of wet and dry wafer surface cleaning, including particle removal, plasma stripping, wet processing, and rinsing and drying. Additional advanced topics, such as cleaning high-k and metal gates, cleaning and repairing low-k and dual damascene structures, high aspect ratio features, and damage-free particle removal, will also be addressed. Find out more.
Welcoming Reception
Don't miss this year's Welcoming Reception on Monday March 31 from 6‑8PM, which will feature the official release of the second edition of the Handbook of Silicon Wafer Cleaning Technology, edited by Werner Kern and Karen Reinhardt. Chapter authors will be on hand to sign copies of the Handbook. Get your discounted copy delivered to the SPCC in time for this exciting event.
