SEMATECH Fab Photo

2008 International Symposium on Extreme Ultraviolet Lithography

September 28 - October 1, 2008
Lake Tahoe, California

The 2008 EUVL Symposium is the key industry forum for industry experts and researchers to discuss and assess the continued progress and maturity of extreme ultraviolet lithography (EUVL) technology and the infrastructure needed to support its insertion into production.

EUVL is now well into the alpha tool demonstration phase, in which critical elements of the technology and infrastructure are--for the first time--being evaluated at the system level. Yet, at the same time the industry still faces a significant number of challenges to prepare for the arrival of EUV beta and pilot production tools in the next few years. These challenges include progress in key critical technology issues such as:

  • Demonstration of reliable high-power source and collector modules
  • Simultaneously meeting resist resolution, sensitivity and line edge roughness specifications
  • Fabricating defect-free masks

The Symposium provides a forum for the worldwide EUVL technology community to gather, present, and discuss new developments, issues, and solutions for the advancement of extreme ultraviolet lithography into cost-effective, manufacturable solutions.

Symposium Updates

  • An optional EUV Mask Workshop will be held in conjunction with the EUVL Symposium on Sunday, September 28, 2008 (1PM-5PM). The purpose of this 4-hour workshop is to review draft SEMI EUVL mask standards for P37/P38 substrates/blanks and for fiducial marks. Separate registration is required.
  • International EUV Initiative Technical Working Group (IEUVI) meetings will be held on Thursday, October 2, 2008. See Program Information for more information.
  • Symposium organizers have made arrangements for a variety of optional activities for symposium attendees on their guests on Tuesday, September 30. See Program Information for more information.

The 2008 International EUVL Symposium is organized by SEMATECH in cooperation with Selete, EUVA, and the EUV Cluster Steering Council.