EUV Source Workshop
May 12, 2008
Bolton Landing (Lake George), NY
In 2008, the power of a fully integrated EUV source is projected to increase from 4W to approximately 100W at Intermediate Focus. To reach this target by the end of 2008 requires that the source power double approximately every two months.
This SEMATECH workshop—which brings together source suppliers, exposure tool suppliers, academia/researchers, and other experts focused on aggressively pursuing the lithography technology roadmap—will update attendees on the recent progress being made in source performance and provide a critical review of the challenges restricting the enhancement of this technology.
The workshop will feature invited speakers and selected poster presentations that address relevant issues and challenges of EUV source technology supporting EUV lithography and metrology applications.
The EUV Source Workshop will also feature a presentation of the results of a recent survey by a wide cross-section of the broad EUV community ranking the critical issues facing EUV sources and whether potential solutions are known.
See Program Information for a workshop agenda.
This workshop is being held in conjunction with the SEMATECH Litho Forum (12-14 May 2008).
