EUV Source Workshop

Program Information

The workshop will feature invited speakers and selected poster presentations that address relevant issues and challenges of EUV source technology supporting EUV lithography and metrology applications, including:

  • Joint source requirements
  • EUV exposure tool source status
  • DPP and LLP source supplier updates
  • Source metrology overview
  • Low power and metrology source status

The EUV Source Workshop will also feature a presentation of the results of a recent survey by a wide cross-section of the broad EUV community ranking the critical issues facing EUV sources and whether potential solutions are known.

Agenda

View a PDF of the meeting agenda.

Contact

For more information about this workshop, please contact Frank Goodwin, Workshop Chair at frank.goodwin@sematech.org or call 518.956.7355.