SEMATECH EUV Source Workshop
May 29-30, 2009
Baltimore, MD
Industry experts have identified the critical gaps in the development of EUV source technology that must be addressed in order to prevent further delay of the insertion of extreme ultraviolet lithography (EUVL) into manufacturing for the sub-32nm node.
This workshop, which will immediately precede the CLEO conference, will bring together source suppliers, exposure tool suppliers, laser and optic suppliers, academia/researchers, and other industry experts focused on aggressively pursuing solutions to this problem.
The focus of this workshop is to measure the progress that has been made toward these challenges and develop a realistic schedule for when solutions will be available.
Unable to travel?
Save time and money by attending this event as a live webinar. For just $395, you and your colleagues can join the workshop from any single computer (including conference rooms). See Registration Details for more information.
