SEMATECH EUV Source Workshop
Call for Papers
The delivery of adequate light sources to support EUV exposure tools has been identified as the single greatest obstacle blocking the critical path to the successful implementation of EUV technology.
While there has been substantial development and progress within the EUV source area there is much more that needs to be undertaken. This technology is at a pivotal stage and significantly increased efforts are needed to intersect the insertion of the 22nm hp technology node.
Papers are currently being solicited to address the critical development gaps, including:
Further development in the fundamental understanding of:
- Debris mitigation of LPP sources
- Power scaling of sources
- Reliability and stability
- Accurate source/plasma modeling
- Maintainability and reasonable downtimes
- Understanding out of band emission from plasma
- Impact of out of band on resist imaging and contamination rates
Engineering development in:
- LPP source/collector/DMS integration
- Improved debris mitigation and handling of fuel of DPP sources
- Improvement of source component designs/materials/lifetimes
- Solutions for spectral filtering, particularly IR
- Design optimization of illuminator
- Improved cost of ownership
- Efficiency of power transmission to IF
- Environmental Safety (particularly on DMS and purge gases)
- Stability and Reliability
- Collector lifetimes as power is scaled up
Ideas and proposals for resolving these issues are being sought from experts across the industry for inclusion this workshop.
Abstract Submissions
Abstracts (in MS Word or PDF only) should be two-page (maximum) and include the selected topic, the challenges being addressed, summary of significant results and conclusions. Please include the names and affiliation of all authors, as well as the e-mail address of the lead author.
Submit abstracts to euv.source.workshop@sematech.org by March 16 2009.
