SEMATECH Litho Forum
May 10-12, 2010
New York, NY
The 2010 SEMATECH Litho Forum is the semiconductor industry’s only global conference on the status and direction of advanced and next‑generation lithography.
This year’s Litho Forum will focus on turning “innovation into value,” the conscious development of lithography solutions that incorporate economic feasibility to provide true value and allow the industry to grow. Topics include:
- Bringing together IDMs and suppliers to address capital cost challenges
- Utilizing government-industry partnerships for innovation and job creation
- Recognizing the benefit of industrial research for society
- Designing and developing devices with cost effectiveness in mind
- Getting innovative products to market when needed
Who's Speaking
- Speakers from alliances, consortia, fabless, foundries, logic and memory companies will describe how their organizations have adapted to maintain the lithography roadmap while staying profitable.
- Equipment and materials suppliers will share strategies for confronting specific economic challenges, such as supply chain issues, shrinking markets and other cost pressures.
- Champions of next-generation technologies will make their cases for new or alternative approaches to advanced lithography.
See Program Information for more details.
Forum Updates
- Litho Forum attendees may also be interested in the SEMATECH Maskless Lithography and Multibeam Mask Writer Workshop (May 10), which is being held in conjunction with the SEMATECH Litho Forum.
- To receive periodic updates about this event, add yourself to the SEMATECH Litho Forum contact list.



