2010 International Symposium on Extreme Ultraviolet Lithography
October 17-20, 2010
Kobe, Japan
The 2010 International Symposium on Extreme Ultraviolet Lithography (EUVL) is the key industry forum for industry experts and researchers to discuss and assess the continued progress and maturity of extreme ultraviolet (EUV) lithography technology and the infrastructure needed to support its insertion into production.
This year’s symposium promises to be the most informative event, committed to addressing challenges and enabling solutions for advancing EUVL.
The industry still faces a significant number of challenges to prepare for EUVL pilot line insertion in 2011-2012 and also for high-volume manufacturing introduction in 2013. These challenges include progress in key critical technology issues such as:
- Mask yield and defect inspection/review infrastructure
- Long-term reliable source operation with 200 W at IF
- Resist resolution, sensitivity and line edge roughness (LER) met simultaneously
- EUVL manufacturing integration
Hosted by Selete and EUVA in cooperation with SEMATECH and EUV CRC.
This symposium will be held in conjunction with the 2010 International Symposium on Lithography Extensions.
Symposium Updates
- Online registration is now open.
- We are still accepting submissions for abstracts of poster presentations
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