(All Presentations are in .PDF format)
| Introduction | Long He (SEMATECH/Intel) |
| Strategy to implement EUVL Blank Fiducial Marks | Pei-yang Yan (Intel) |
| Fiducial mark study | Yoshiaki ikuta (Asahi Glass Company) |
| Blank Fiducial Mark: Samsung’s point of view | Sean Huh (SEMATECH/Samsung) |
| Standardization of Fiducial Mark on EUV
Blank mask |
Sean Huh (SEMATECH/Samsung) |
| Nanoparticle Metrology forEUVL Tools and InspectionSystems | David Y. H. Pui (University of Minnesota) |
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