| CONTAMINATION & CLEANING |
|
| Feasibility Assessment of In Situ Metrology for Monitoring and Control of EUV Optics Contamination |
N.V. Edwards, et al. (SEMATECH) |
| A New Contamination Evaluation System for EUVL Projection Mirrors in New SUBARU |
M. Niibe, et al. (University of Hyogo, et al.) |
| Progress in the optics lifetime programme for ASML EUV Lithographic Tools |
B. Wolschrijn, et al. (TNO Science and Industry, et al.) |
| COST OF OWNERSHIP |
|
| Trends in the Cost of Photolithography Development and an Outlook for the Future |
F. Goodwin, et al. (Infineon Technologies North America) |
| DEFECT INSPECTION |
|
| Characterization of Actinic Mask Blank Inspection for Improving Sensitivity |
Y. Tezuka, et al. (ASET) |
| Study on Inspection Property of EUV Mask Defects by Simulation and Experimental Approach |
J. Park, et al. (Samsung Electronics) |
| Defect Inspection of EUV Mask Blank Using Confocal Microscopy |
S.-S. Kim, et al. (Samsung Electronics) |
| EXPOSURE TOOL |
|
| Printabiliby of Contact-Hold Patterns in EUVL Using 0.3-NA HiNA Optics |
Y. Tanaka, et al. (ASET) |
| MASK |
|
| Simulation analysis of impact of off-axis incidence on printability and new algorithm for mask pattern correction |
M. Sugawara et al. (ASET) |
| Mask Modification for the shadow effect reduction by rigorous coupled-wave analysis in extreme ultraviolet lithography |
Min-Ki Choi, et al. (Hanyang University) |
| Defect repair of TaGeN absorber layer |
T. Abe, et al. (Dai Nippon Printing Co., et al.) |
| Reduction of nodular type defect on Extreme Ultraviolet mask blanks: Application to a new mask manufacturing process named “reverse technology” |
C.Constancias, et al. (CEA-Leti) |
| Mechanisms for Nanoparticle Detachment with Laser-induced Plasma (LIP) Shockwaves |
C. Cetinkaya (Clarkson Univ.) |
| Influence of Particle Contamination on EUVL Reticle Distortion during Exposure Chucking |
V. Ramaswamy, et al. (University of Wisconsin) |
| EUV-Mask Blanks by Ion Beam Sputter Deposition: A Novel Tool Concept and Tool Results |
J. Dienelt, et al. (Leibniz-Institut für Oberflächenmodifizierung e.V., et al.) |
| Optimization of Absorber Stack of EUVL Mask in Optical and Etch Properties |
Seung Yoon Lee, et al. (Hanyang University) |
| Programmed Phase Defect Fabrication with a Focused Ion Beam |
G. Denbeaux, et al. (University at Albany NY, et al.) |
| RIM-13: A high-resolution imaging tool for aerial image monitoring of patterned and blank EUV reticles |
M. Gower, et al. (Exitech, Paragon Optics) |
| METROLOGY |
|
| Status of the High Accuracy EUV Reflectometry Beamline at the ALS |
E.M. Gullikson, et al. (Lawrence Berkeley National Laboratory) |
| Systematic error evaluation of EUV wavefront metrology system |
M Okada, et al. (EUVA, et al.) |
| Sub-40nm Spatial Resolution Imaging with 13.2 nm wavelength Illumination from a Table-top Laser |
G. Vaschenko, et al. (Colorado State University, et al.) |
| EUV Source and Optics System for Metrology |
F. Barkusky, et al. (Laser-Laboratorium Göttingen e.V.) |
| EUV Wavefront Metrology System in EUVA |
T. Hasegawa, et al. (EUVA, et al.) |
| OPTICS |
|
| Generating lithographic objectives via saddle points |
O. Marinescu, et al. (Delft University of Technology) |
| Point Diffraction Interferometer for Testing EUVL Projection Optics |
S. Takeuchi, et al. (Canon, Inc., et al.) |
| Novel Method for Fabrication of High Efficiency Diffractive Optics for Extreme Ultraviolet |
R. Garg, et al. (University at Albany NY) |
| RESIST |
|
| Integration of self-assembling resist materials into the lithographic process |
P.F. Nealey, et al. (University of Wisconsin, et al.) |
| EUVL Process Modeling |
S. Postnikov, et al. (Freescale Semiconductor, et al.) |
| New Types of Photoresists for Extreme-UV Lithography |
Hyun-Soo Ryu, et al. (Seoul National University, et al.) |
| Molecular Resist Based on Low Molecular Weight Polyphenol with High Activation Energy Protecting Group for EUVL |
T. Hirayama, et al. (Tokyo Ohka Kogyo Co., et al. 2-Hitachi, Ltd.) |
| Beneficial Photoacid Generator for Chemically Amplified Resist in EUVL |
T. Watanabe, et al. (University of Hyogo, et al.) |
| Molecular Resists Based on Cholate Derivatives for EUVL |
D. Shiono, et al. (Tokyo Ohka Kogyo Co., et al.) |
| EUV Stimulated Photo-Resist Outgassing |
A. Keen et al. (BOC Edwards) |
| RETICLE PROTECTION |
|
| Progress in particle-free handling of reticles in the ASML EUV program |
E. Ham, et al. (TNO Science and Industry, et al.) |
| Modeling of protection schemes for EUVL masks under low pressure conditions. |
David Y.H. Pui et.al. (Department of Mechanical Engineering, University of Minnesota) |
| SOURCE |
|
| Performance of Kilowatt-Class Laser Modules in Scaling Up Laser Produced Plasmas (LPP) EUV Source |
S. Ellwi, et al. (Powerlase Limited) |
| A Novel. High-Brightness Electrodeless Z-Pinch EUV Source |
P.A. Blackborow, et al. (Energetiq Technology) |
| Optimal conditions for the maximal emission of EUV radiation from laser plasma created by CO2 and Nd-glass lasers |
A.A. Andreev, et al. (Institute for Laser Physics, et al.) |
| High Conversion to 13.5 EUV and Debris Mitigation with Mass-limited Plasmas Generated with Laser |
H Nishimura, et al. (Osaka University, et al.) |
| Characteristics of Ion Emission from CO2/Nd:YAG LPP with tin target |
A. Takahashi, et al. (Kyushu University) |
| Sn cleaning with hygrogen radicals |
M. van Herpen, et al. (Philips Research) |
| Characteristics of EUV emission using mass-limited targets supplied with a novem method |
M. Yamaura, et al. (Osaka University, et al.) |
| Time-Resolved Study of Dense Plasma Focus for EUV Generation |
N. Oshima, et al. (Nagaoka University of Technology, et al.) |
| EUV Source Developments on Laser-Produced Plasmas using Lithium New Scheme Target |
S. Miyamoto, et al. (University of Hyogo) |
| Studies on laser-produced plasma EUV generation by using fast-supplying cryogenic Xe targets |
T. Inoue, et al. (University of Hyogo) |
| Progress in LPP EUV Source Development by Japan MEXT Project |
Y. Izawa, et al. (Osaka University, et al.) |
| KrF Laser Driven Xenon Plasma Light Source of a Small Field Exposure Tool |
G. Sougmagne, et al. (EUVA, et al.) |
| Modeling and Simulation of Various Debris Mitigation Systems for Laser and Discharge Produced Plasma in EUV Lithography Devices |
V. Sizyuk, et al. (Argonne National Laboratory, et al.) |
| Radiative properties of Xe and Sn plasmas |
A. Sasaki, et al. (Japan Atomic Energy Research Institute, et al.) |
| Dynamics of Neutral Debris from Laser-Produced Tin Plasma Studied by Laser-Spectroscopic Imaging |
T. Hiroki, et al. (Kyushu University) |
| Development of a CO2 Laser Produced Xenon Plasma for EUVL |
Y. Ueno, et al. (EUVA) |
| Theoretical Modeling and Optimization of LPP EUV Light Source |
K. Nishihara, et al. (Institute of Laser Engineering, et al.) |
| Optimized Parameters for Generating a Laser-Produced Tin Plasma as a Source for High Volume Production |
T. Tomie (ASRC-AIST) |
| Optimization Study of Magnetic Mirror for Debris Mitigation in LPP EUV Source+F21 |
Y.-G. Kang, et al. (Osaka University, et al.) |
| Physics of Laser-produced Li Plasma EUV Light Source |
T. Nishikawa, et al. (Okayama University, et al.) |
| Target Fabrication of Low-density and Nanostructured Tin, Lithium, and Xenon as Laser Targets to Generate EUV |
K. Nagai, et al. (Osaka University) |
| Mitigation of Debris Emitted by Plasma Sources: Theoretical End Experimental Results at ENEA |
F. Flora, et al. (ENEA) |
| Lithium Discharge EUV Source |
M. McGeoch (PLEX LLC) |
| Charge Exchange Spectroscopy of Ions Composed EUV Light Source plasmas |
H. Tanuma, et al. (Tokyo Metropolitan University, et al.) |
| Collector Development Integrated in EUV Source Test Stand |
V. Rigato, et al. (Media Lario Technologies, et al.) |
| Session 2 |
|
| CONTAMINATION & CLEANLINESS |
|
| Degradation of Mo-Si Multilayers Irradiated with a Laser Plasma EUV Source |
H. Fiedorowicz, et al. (Military University of Technology) |
| NIST Metrology Programs to Support EUV Lithography |
S. Grantham, et al. (NIST) |
| Amorphous RuO 2 Capping Layers for EUV Mirrors |
H. Over, et.al. (Intel) |
| MASK |
|
| Predicting the Flatness of an EUV Mask after Electrostatic Chucking |
M. Nataraju, et al. (University of Wisconsin) |
| Impact of Multi-Layer Deposition Method on Defects for EUVL Photomask Blanks |
J. Cullins, et al.. (ASET) |
| Ta-Based Absorber Added by Si for EUV Mask |
K. Kanayama, et al. (Toppan Printing Co.) |
| Low Thermal Expansion Material “CLEARCERAM®-Z” for EUVL Components Application |
K. Nakajima, et al. (OHARA Inc.) |
| Investigations on Pattern Placement Accuracy of EUV Mask |
S. Yoshitake, et al. (NuFlare Technology, Inc., et al.) |
| Observation of Phase Defects Using an EUV Microscope |
H. Kinoshita, et al. (University of Hyogo, et al.) |
| Characterization of Striae in ULE® |
W. Rosch, et al. (Corning Inc.) |
| EUV Mask Fabrication at Samsung |
D. Kim, et al. (Samsung Electronics) |
| Phase Shift Mask for Extreme Ultraviolet Lithography |
C.Constancias, et al. (CEA-Leti) |
| Particle Removal in EUV Mask Cleaning |
S. Eichenlaub, et al. (University at Albany NY, et al.) |
| METROLOGY |
|
| Table-top EUV reflectometer for advanced mirror characterization |
Ulf Hinze, et.al, Phoenix EUV Systems |
| An Automated Reflectometer for Measurement of Reflectivity of EUV Lithography Masks: Results from our recently delivered tools |
J. Underwood et al. (EUV Technology) |
| Development of a Fizeau Interferometer for Measuring Free Form Flatness |
K. Otsuka, et al. (Asahi Glass Company, et al.) |
| Applications of Chemical Force Microscopy in EUV Lithography |
J.T. Woodward, et al. (NIST, et al.) |
| Major Upgrades to the NIST/DARPA EUV Reflectometry Facility |
C. Tarrio, et al. (NIST) |
| An EUVL Application Specific Wide Range Spectrometer Design |
A. Shevelko, et al. (Setpoint Spectrometers) |
| MULTI-LAYER COATINGS |
|
| High-temperature Multilayer Coating of Source Collector Mirror |
T. Feigl, et al. (Fraunhofer Institute, et al.) |
| Thermal Stability of Mo/Si Multilayers with Ru Inter-Layers |
V. Rigato, et al. (INFN-Laboratori Nazionali de Legnaro, et al.) |
| Narrow band Mo/Si EUV Multilayers with Thick Si Structures |
T. Harada, et al. (Tohoku University) |
| Multi-layer Optics with Spectral Purity Layers for the EUV Wavelength Range |
E. Louis (FOM Rijnhuizen) |
| OPTICS |
|
| MoSi Coating Performance on EUVL Optics for an Imaging System |
M.D. Kriese, et al. (Osmic, Inc., et al.) |
| Performance Characterization of the First EUV Optical Imaging Module of the Reticle Imaging Microscope (RIM) |
H. Glatzel, et al. (Tinsley Labs, et al.) |
| Lithographic Measurement of EUV Flare in the Berkeley MET Optic |
J.P. Cain, et al. (UC Berkeley, et al.) |
| Multilayer Coatings for the First EUVL Process Development Tool |
E. Louis, et al. (FOM Rijnhuizen, et al.) |
| RESIST |
|
| EUV Resist Outgassing |
K.R. Dean, et al. (SEMATECH, et al.) |
| Development of EUV Resist Materials based on Molecular Glass Resist and Non-PFOS Photoacid Generators |
D. Bratton, et al. (Cornell University, et al.) |
| Characterization of Resist LER in the Patterns Replicated by HiNA-3 |
Y. Kikuchi, et al. (ASET) |
| Polycarbocycle-based Molecular Resists for EUV Lithography |
P. Argitis, et al. (NSCR "Demokritos", et al.) |
| High Resolution by EUV Interferometer Lithography |
A. Jouve, et al. (CEA-Leti, et al.) |
| Outgassing Tool at CEA-Leti |
Ph. Michallon, et al. (CEA-Leti) |
| RETICLE PROTECTION |
|
| Investigation of Thermophoretic Protection with Speed-Controlled Particles at 100 mTorr, 50 mTorr, and 25 mTorr |
David Y.H. Pui, et. al.(Department of Mechanical Engineering, University of Minnesota) |
| Investigation on Particle Generation during Vibration of mask Carriers and Developments of Protection Schemes for EUVL Mask Carrier Systems |
David Y. H. Pui, et. al. (Department of Mechanical Engineering, University of Minnesota) |
| SENSORS & DIAGNOSTICS |
|
| EUV Photodiodes with Directly Deposited Uranium Filter |
R. Korde, et al. (Int'l. Radiation Detectors, Inc., et al.) |
| SOURCE |
|
| Efficient EUV Generation from Lithium |
M. Al-Rabban, et al. (Qatar University, et al.) |
| Current Control for Efficient Z-pinch EUV Light Source |
K. Horioka, et al. (Tokyo Institute of Technology) |
| Development of a Gas Jet Type Z-pinch EUV Light Source |
E. Hotta, et al. (Tokyo Institute of Technology) |
| EUV Source System |
I. Fomenkov, et al. (Cymer) |
| High Efficiency Xenon Recycling for EUV Sources |
C. Hughes, et al. (BOC Edwards) |
| EUV Light Generation with the EXULITE LPP Prototype |
O. Sublemontier, et al. (CEA Saclay, et al.) |
| Modification of Z-pinch Plasmas with External Axial Magnetic Fields |
Y Kondo, et al. Kumamoto University, et al.) |
| Z-pinch Plasma EUV Sources Driven by Extremely Fast Currents |
H. Horita, et al. Kumamoto University, et al.) |
| 20 kHz Pulsed Power Generator for GDPP EUV Sources |
H. Fukumoto, et al. (Kumamoto University, et al.) |
| Cleaning of Condensable Fuels from EUV Optics |
M.J. Neumann, et al. (University of Illinois at Urbana-Champaign, et al.) |
| Debris Characterization and Collector Material Lifetime for a Commercial Tin-based Z-pinch Extreme Ultraviolet Light Source |
H. Qiu, et al. (University of Illinois at Urbana-Champaign, et al.) |
| Dynamics of Laser Produced Sn Plasmas for Extreme Ultraviolet Lithography Source |
Y. Tao, et al. (Univ. California-San Diego) |
| Development of Efficient Fiber-laser-produced Plasma Source of EUV Radiation |
A. Mordovanakis, et al. (University of Michigan, et al.) |
| EUV Spectroscopy of Sn Doped Foam Targets |
S.S. Harilal, et al. (University of California San Diego, et al.) |
| First Use of the Energetiq 10W Electrodeless EUV Plasma source |
G. Denbeaux, et al. (University at Albany NY, et al.) |
| Development of High Repetition Rate and High Power DPP EUV |
G. Niimi, T. Shirai, et al. (EUVA, et al.) |
| Characteristics of Emission Lines from Xe, Sn, and Other Species at EUV Region |
F. Koike, et al. (Kitasato University, et al.) |
| Impact Ionization and Excitation of Multicharged Ions in DPP & LLPP |
V.S. Zakharov, et al. (Keldysh Institute of Applies Mathematics RAS, et al.) |
| A Black Box Modeling Engine for Optimization Modeling of EUV Plasma Sources |
S.V. Zakharov, et al. (EPPRA sas, et al.) |
| The Strongly Multiplexed Micro Plasma Pulse EUV Source Concept |
P. Choi, et al. (EPPRA sas, et al.) |
| Optimization of EUVL Plasma Radiation Source Characteristics Using HELIOS-CR |
J.J. MacFarlane, et al. (Prism Computational Sciences) |
| EUV Emission from a Laser-produced Tin Plasma by Use of a Liquid Microtarget |
N. Dojyo, et al. (University of Miyazaki) |
| Properties of EUV Emission from a Laser-produced Lithium Plasma |
K. Kawasaki, et al. (University of Miyazaki) |
| The Effect of Fast Sn Ion Bombardment on EUV Lithography Grazing Incidence Collector Mirror Reflectivity |
J.P. Allain, et al. (Argonne National Lab, et al.) |
| Tin Based Laser-produced Plasma Source Development for EUVL |
A. Cummings, et al. (University College Dublin,) |
| Technology Advances that Enable a Cost-Effective LPP EUV Source |
P. Banks, et al. (General Atomics, et al.) |
| The Tin-doped Droplet Laser Plasma Source – Meeting Roadmap Requirements |
M. Richardson, et al. (Univ. of Central Fl., et al) |
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