2nd International Symposium on Immersion Lithography

12-15 September 2005
Oud Sint-Jan, Bruges, Belgium

Posters
DEFECTIVITY/RESIST-LIQUID INTERFACE
Study on the Effects of Micro Bubbles in Immersion Lithography	YAO Teruyoshi
Studies of the defectivity formation mechanisms between the top coats and resists in immersion lithography	STEPANENKO Nickolay
Modeling of field distortion by an air bubble in immersion lithography, light scattering analysis via Discrete Sources Method	EREMINA Elena
ArF Immersion resist development status	KANNA Shinichi
Study on the resist materials leaching from resist film during 193nm immersion exposure using QCM method	SEKIGUCHI Atsushi
Evaluation of interactions between water fluid and resist polymers, resists, and top coats using QCM method	MATSUBARA Chie
193nm Immersion Material Top-coat Acid and Resist Photo Acid Generator Interaction	BENSON Peter A.
Immersion topcoat progress – the path to success	SMITH Jeff
Solvent effects for immersion properties of cover-coat materials	ITO Shinichi
Measuring Resist-Topcoat Compatibility Using Ellipsometry	SCHWARZ Christian J.
The Influence of Water Soaking and Top Coat Processing on Resist Profile Control in Immersion Lithography	FOUBERT Philippe
The importance of dynamic contact angles in immersion lithography and how to measure them	FYEN Wim
Interactions at the Interface between Top coat and Resist	OKUMURA Haruki
Effect of water on resist performance beyond resolution enhancement in 193nm immersion lithography	KIM Hyun-Woo
Top Coat Compatibility Studies: What you wanted to know about resist/top coat compatibility but were afraid to ask	PETRILLO Karen
IMMERSION PROCESS IMPLEMENTATION
Validation of immersion lithography OPC model accuracy	ESTROFF Andrew
RET imaging capability with 0.85NA ArF immersion lithography	WIAUX Vincent
An Integrated Imaging System for the 45nm Technology Node Contact Holes Using Polarized OAI, Immersion, Weak PSM, ans Negative Resists	PETERSEN John S.
Photoresist and process issues on the 193nm immersion lithography	YOON Jin-Young
Process optimization to identify specific immersion issues	KYODA Hideharu
ESH Assessment of 193 nm Immersion Lithography	WORTH Walter F.
Advancements in LER Performance	TURNQUEST Karen
Application of Immersion Lithography inside the MEDEA+ LIQUID Project	MASSIN Jean
Point-of-Use Ultra-PureWater of Immersion Lithography	CLARKE Michael
TOOLS
Compact excimer lasers for metrology and interferometric immersion lithography tools	GOERTLER Andreas
Throughput improvements for the 8X mask magnification	TAKEHISA Kiwamu
XLA-300: the Fourth-Generation ArF MOPA Light Source for Immersion Lithography	ISHIHARA Toshihiko
More Efficient Use of Expensive Photons: New Refractive Optical Elements (ROE) Serve as Highly Efficient Pupil Defining Illumination Element	ASCHKE Lutz
High Power Injection Lock Laser light source for ArF Immersion Lithography	MIZOGUCHI Hakaru
MASKS
The Capability of a 1.3NA mstepper using 3D EMF Mask Simulations	CONLEY Will
Printability Study Using Immersion and Polarization Based AIMS™ for 65nm Node	ZIBOLD Axel
Materials Solutions to High-NA/Hyper-NA Polarization Issues	LASSITER Matthew G.
Impact of AAPSM etch depth linearity in ArF immersion lithography	CANGEMI Michael
INTERFERENCE IMAGING
45nm Node Resist Evaluations Using Interference Imaging	MEUTE Jeff
Hyper-NA imaging using two-beam interference	HENDRICKX Eric
Hyper high NA achromatic interferometer for immersion lithography	CHARLEY Anne-Laure
Research Activities Using Immersion Interferometric Lithography	FAN Yongfa
HYPER NA BARC
The solution for reflectivity control at high NA imaging: Go wet!	GEHOEL-VAN ANSEM Wendy
Consideration of BARC design for hyper NA immersion Lithography	SAKAMOTO Rikimaru
BARC process optimization for hyper NA tools and influence of polarization on CD swing ans standing waves	OP DE BEECK Maaike
Optimization of Dual BARC Structures for Hyper-NA Immersion Lithography	MATSUZAWA Nobuyuki
Reflectivity dependency using the Brewster angle and ARC with polarized illumination for immersion lithography	JUNG MiRim
Process Latitude Analysis by Polarization Effect at Hyper NA	Kwak Eun A
HIGH N FLUIDS & RESISTS
Development of fluoropolymer for 193-nm immersion lithography	TAKEBE Yoko
The ab-initio calculation study for finding higher refractive index fluid	IRISAWA Jun
Feasibility of liquid immersion lithography at 157-nm	TSUJI Shou
Determination of the index of refraction of the immersion liquid at 193.7 nm	STEHLE Jean-Louis
An Update on the Synthesis of High Refractive Index Sulfur Containing Polymers for 193nm Immersion Lithography	BLAKEY Idriss
Amplification of the Index of Refraction of Aqueous Immersion Fluids: From Surfactants and Inorganic Salts to Zeolites.	LEE Kwangjoo
Develoment of high refractive index fluids for 193nm immersion lithography	OTOGURO Akihiko
OPTICAL MATERIALS
Material performance to support polarized light illumination	LIU Jiyuan
Synthetic Fused Silica tailored for 193 nm Immersion Lithography	KUEHN Bodo
Quality Improvement of CaF2 single crystals for 193nm immersion lithography	SENGUTTUVAN Nachimuthu
Total quality of CaF 2 single crystal grown by the CZ method	INUI Yoji
BaF 2 single crystal grown by the CZ method as High-index Materials for High-NA Immersion Lithography	SATO Hiroki
Novel Optical Materials with Extremely high Refractive Index and Manufacturing Potential Analysis	PARTHIER Lutz