2nd International Symposium on Immersion Lithography

12-15 September 2005
Oud Sint-Jan, Bruges, Belgium

Proceedings
IMMERSION IMPLEMENTATION
193-nm immersion lithography for 65-nm node and below	LIN John C.H.
Performance update of XT:1250Di	MAENHOUDT Mireille
Imaging with Immersion Technology at Albany Nanotech	MARTINICK Brian
A “Plunge and Play” Option for 65-nm Technology?	MORTON Robert
Effect of wetting time on CD control in immersion lithography	PATEL Kaushal S.
DEFECTIVITY
Prospects and Challenges of Defectivity in Water Immersion Lithography	OKOROANYANWU Uzo
The Role of Evaporation in Defect Formation In Immersion Lithography	GIL Dario
Defectivity data taken with a dull-field immersion xposure tool	NAKANO Katsushi
Immersion Defect Studies on the 1150i a-tool	BRANDL Stefan
Novel detection technique for immersion specific defects	BENNDORF Michael
MASKS
Scalability of subwavelength mask imaging for 2 nd -generation ArF immersion lithography and beyond	CHENG Wen-Hao
Mask material dependency of aquatic image quality with hyper NA	YAMAMOTO Norihiro
Modeling 3D-Mask Polarization Effects for OPC in Immersion Lithography	ADAM Kostas
Mask blank stress birefringence requirements for hyper-NA lithography	LEUNISSEN Leonardus H.A.
HYPER NA/POLARISATION
The Life of ray	PROGLER Christopher J.
Quality of polarized illumination and its effect to hyper NA imaging	MATSUYAMA Tomoyuki
Ultra-High NA Exposure Tools for the 50 nm node and beyond	KNEER Bernhard
Polarization aberrations in ultra high-NA projection printing: A comparison of various representations	McINTYRE Gregory
RESIST-LIQUID INTERFACE
Topcoat Design for Immersion Lithography	ALLEN Robert
Understanding the Photoresist Surface-Liquid Interface for ArF Immersion Lithography; A Progress Report	CONLEY Will
Resist properties for scanners : leaching of chemicals and surface condition scanning	KOHNO Hirotaka
Topcoat investigation for immersion specific issue prevention	OHMORI Katsumi
Film pulling and meniscus instability as a cause of residual fluid droplets	VAN PESKI Chris
EXPOSURE TOOLS
Advancements in System Technology for the Immersion Lithography Era	STREEFKERK Bob
Full-field exposure tools for ArF immersion lithography	FUJIWARA Tomoharu
Development Status of a 193-nm Immersion Scanner	NAKANO Hitoshi
HIGH N FLUIDS AND RESISTS
High index materials for 193 nm immersion lithography	BURNETT John H.
Solid Immersion Lithography Results for 25nm Resolution: Lithography at NA>1.60	SMITH Bruce W.
Controlled Contamination Studies with Photoacid Generators in 193-nm Immersion Lithography	LIBERMAN V.
Immersion Lithography Water Quality at Albany Nanotech	ROBINSON Chris
New Developments in Second Generation 193 nm Immersion Fluids For Lithography with 1.5 Numerical Aperture	PENG S.
Development of high index fluids for immersion lithography	JAHROMI Shabab
Material Design for Highly Transparent Fluids of the Net Generation ArF Immersion Lithography	WANG Yong
A QSPR Approach to the Rational Design of High Refractive Index Polymers for 193 nm Immersion Lithography	WHITTAKER Andrew K.
Immersion lithography beyond water	MULKENS Jan