Workshop Proceedings |
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| Welcome & Introduction | Vivek Bakshi/SEMATECH | |
| Update on EUV Source Requirements ASML / Canon / Nikon |
Vadim Banine/ASML | |
| EUV Source Technology Status | Vivek Bakshi/SEMATECH | |
| SESSION 2: High Power Source Feasibility – panel discussion questions | ||
| EUV Scanner Optical Design Limits: | ||
| Carl Zeiss | Peter Kuerz | |
| Nikon | Takeshi Asami | |
| Canon | Hajime Kanazawa | |
| Resist Performance Limits | Robert Bristol/Intel | |
| Feasibility of Updated Source Requirements: | ||
| XTREME | Uwe Stamm | |
| Cymer | Igor Fomenkov | |
| Philips | Joseph Pankert | |
| EUVA | Georg Soumagne | |
| Intel | Robert Bristol | |
| Feasibility of Lithium as Fuel for High Power Sources: | ||
| Univ. of Miyazaki | Takeshi Higashiguchi | |
| Cymer | Alex Ershov | |
| PLEX LLC | Malcolm McGeoch | |
| High Power Laser Requirements | Martin Richardson/UCF | |
| High Power Laser Amplifier – Efficiency Considerations | Malcolm Gower/Exitech | |
| Fiber Based High Power Lasers | Almantas Galvanauskas/ Univ. of Michigan | |
| High Power Nd: YAG Lasers: | ||
| General Atomics | Mike Campbell | |
| Osaka Univ. | Hisanori Fujita | |
| PowerLase | Samir Ellwi | |
| XTREME technologies | Christian Ziener | |
| High Power Excimer Lasers | Igor Fomenkov/Cymer | |
| High Power Pulsed CO2 Lasers | Georg Soumagne/EUVA | |
| High Power Laser Technology Status Summary | Obert Wood/ SEMATECH/AMD | |
| Collector Lifetime & Debris Mitigation – panel topic | ||
| Debris Mitigation Technology Limit: | ||
| ANL | Ahmed Hassanein | |
| UIUC | David Ruzic | |
| UC San Diego | Mark Tillak | |
| Osaka | Katsunobu Nishihara | |
| Collector Lifetime Limits for DPP (Xe and Sn): | ||
| Philips Extreme | Peter Zink | |
| XTREME technologies | Uwe Stamm | |
| Media Lario | Ajit Paranjpe | |
| Collector Lifetime Limits for LPP (Xe and Sn) | Alex Ershov/Cymer Georg Soumagne/EUVA | |
| Utility Requirements of Semiconductor Industry | Phil Naughton/ ISMI/Freescale | |
| Updated Cost of Ownership Model | Phil Seidel/SEMATECH | |
| Utility Requirements for Sources/Scanners – panel discussion | ||
| Utility Requirements for EUV Sources and Scanners: | ||
| ASML | Noreen Harned | |
| Canon | Hajime Kanazawa | |
| Nikon | Susumu Mori | |
| Out-of-Band Radiation Measurements: | ||
| UCD | Padraig Dunne | |
| EUVA | Georg Soumagne | |
| EUVA | Masaki Yoshioka | |
| XTREME technologies | Max Christian Shürmann | |
| SPF Technology: | ||
| FOM | Fred Bijkerk | |
| Phystek | Leonid Shmaenok | |
| Workshop Highlights | Vivek Bakshi/SEMATECH | |
| Posters | ||
| Facility System Changes Needed to Support EUVL | Phil Naughton (ISMI / Freescale) | |
| Lithography EUV Source Cost of Ownership Models & Analysis | Phil Seidel (SEMATECH) | |
| EUV Tube for Advanced At-Wavelength Metrology | Andrè Egbert, et al. ( Phoenix EUV Systems + Services GmbH) | |
| New Tool for Reflectivity Measurement in the EUV | Ulf Hinze, et al. (Laser Zentrum Hannover e.V) | |
| EUV Spectrometer | Erik Schoeffel, et al. (McPherson, Inc., et al.) | |
| Measurements of EUV Radiation at the Intermediate Focus | Norbert Böwering, et al. (Cymer) | |
| Modular LPP EUV Source Optimization and Scalability | F. Beaumont, et al. (CEA-DEN/DPC/SCP, CEA Saclay, et al.) | |
| Spectroscopic Diagnostics of Z-pinch Sn Plasma in EUVL Prototype Source | K. Koshelev, et al. ( Institute of Spectroscopy RAS, et al.) | |
| In-situ and Ex-situ and X-ray Reflectivity Experiments and Modeling of Sn-Exposed Collector Mirrors for EUVL Sn-based Sources | J.P. Allain, et al. (Argonne National Laboratory, et al.) | |
| Modleing and Simulation of Various Debris Mitigation Systems for Laser and Discharge Produced Plasma in EUVL Devices | V. Sizyuk, et al. (Argonne National Laboratory, et al.) | |
| 13.5 nm Conversion Efficiencies for Tin Laser-Produced Plasmas: Dependence on Laser Wavelength | Joseph MacFarlane (Prism Computational Sciences) | |
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