EUV Mask Technology & Standards Workshop

10 November 2005
San Diego, CA

Technical Panel Discussion

 
Welcome; Opening Remarks; Goals & Expected Outputs P. Seidel – SEMATECH
   

Session 1: LTEM and Substrate

 
Supplier #1: Corning B. Sell – Corning
Supplier #2: OHARA B. Hoffman – OHARA
Supplier #3: Asahi Glass Company S. Kikugawa- AGC
Infrastructure Supplier #1: Steag – Hamatech B. Lewis - Hamatech
Defect Inspection Expertise: SEMATECH P. Kearney - SEMATECH
Customer #1: Hoya T. Shoki - Hoya
Customer #2: Schott Lithotec H. Seitz – SLT
   

Session 2: Blank

 
Supplier #1: Schott Lithotec H. Seitz – SLT
Supplier #2: Hoya T. Shoki - Hoya
Supplier #3: Asahi Glass Company K. Matsumoto - AGC
Infrastructure Supplier #1: Steag – Hamatech B. Lewis - Hamatech
Infrastructure Supplier #2: Veeco R. Randive – Veeco
Defect Inspection Expertise: SEMATECH P. Kearney - SEMATECH
Customer #1: Dai Nippon Printing N. Hayashi - DNP
Customer #2: Adv. Mask Technology Center (AMTC) U. Dersch – AMTC
Customer #3: Intel G. Zhang - Intel
   

Session 3: Patterned Mask

 
Supplier #1: Dai Nippon Printing N. Hayashi - DNP
Supplier #2: Adv. Mask Technology Center (AMTC) U. Dersch – AMTC
Supplier #3: Intel B. Lieberman - Intel
Infrastructure Supplier #1: NuFlare Y. Shusuke - NuFlare
Infrastructure Supplier #2: Leica Microsys J. Whittey - Leica Micro
Infrastructure Supplier #3: KLA - Tencor L. Zurbrick – KLA-Tencor
Infrastructure Supplier #4: Zeiss SMT K. Edinger - Zeiss SMT
Customer # 1: ASML B. Blum - ASML
Customer # 2: Nikon K. Ota - Nikon
Customer # 3: Canon G. Yoshio - Canon
Customer # 4: Infineon F. M. Kamm - Infineon
   

Session 4: EUV Mask Usage

 
Supplier #1: ASML B. Blum - ASML
Supplier #2: Nikon K. Ota - Nikon
Supplier #3: Canon G. Yoshio - Canon
Infrastructure Supplier #1: Entegris S. Sumner - Integris
Customer #1: Infineon F. M. Kamm - Infineon
Customer #2: Intel G. Zhang - Intel
   

Meeting / Session Outputs

 
Meeting/Session Outputs P. Seidel - SEMATECH
   

Standards Discussion

 
Welcome and agenda overview Phil Seidel
SEMI meeting requirements Phil Seidel
Univ. Wisc. Flatness P-38 Films Definition Roxann Englestad
Updates and recent suggestions for P37 & P40 Roxann Englestad
Intel suggestions on in FAB carrier and shipping carrier Mike Salib  
Entegris carrier prototype results Stephen Sumner
AMTC report out on carrier developments Uwe Dersch
Report on mask lifecycle material in tool flow consolidation Stephen Sumner
Detailed review and discussion of July ’05 survey database Long He
Action items review and main outputs   Phil Glynn

Download ZIP file of entire workshop proceedings (16 Mb)

 

Contact Information:

Send questions or comments to litho@sematech.org