SEMATECH EUV Source Workshop
May 25, 2006
Vancouver, Canada
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SESSION 1: Supplier Updates |
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| Update on EUV Source Requirements: ASML / Canon / Nikon |
Kazuaki Suzuki / Nikon | |
| High Power EUV Source | ||
| Cymer | Bjorn Hanson | |
| EUVA | Akira Endo | |
| Philips Extreme | Joseph Pankert | |
| PLEX LLC | Malcolm McGeoch | |
| Xtreme Technologies | Uwe Stamm | |
| Energetiq | Paul Blackborow | |
SESSION 2: Panel Discussion |
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 view video |
Intro | Vivek Bakshi, SEMATECH |
| Scanner Manufacturers | ||
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ASML | John Zimmerman |
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Canon | Hajime Kanazawa |
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Nikon | Kazuaki Suzuki |
| Suppliers | ||
| view video |
Cymer | David Brandt |
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EUVA | Akira Endo |
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Philips Extreme | Joseph Pankert |
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PLEX LLC | Malcolm McGeoch |
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Xtreme Technologies | Uwe Stamm |
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Media Lario | Ajit Paranjpe |
| IC Manufacturers | ||
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AMD | Bruno LaFontaine |
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Qimonda | Stefan Wurm |
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Intel | Janice Golda |
| R&D | ||
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University of Central Florida | Martin Richardson |
SESSION 3: Limits of EUV Resist |
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| LBNL | Patrick Naulleau | |
| AMD | Bruno LaFontaine | |
SESSION 4: EUV Source Collector |
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| Thermal and Optical Characterization of Collectors for EUVL | Fabio Zocchi, Media Lario | |
| New Efficient and Durable EUV Collector Concept | Roland Geyl, Sagem | |
| A Novel, Low-Power EUV Source-Optic Architecture | Brian Jurczyk, Starfire LLC | |
| Collector Development for Tin Based EUV Sources | Shailendra Srivastava, University of Illinois at Urbana - Champaign | |
| EUV Collector Mirrors for High-Power LPP Sources | Torsten Feigl, Fraunhofer Institute; Cymer | |
| Multilayer Optic Fabrication | M. D. Kriese, Osmic | |
| Collector Issues Associated with Long Life Operation of Tin Droplet based LPP Source | Martin Richardson, University of Central Florida | |
SESSION 5: Benchmarking |
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| SEMATECH Benchmarking Projects | Vivek Bakshi, SEMATECH | |
| Benchmarking of EUV Source Models: DPP | Vivek Bakshi, Institute of Spectroscopy of Russian Academy of Sciences | |
| Benchmarking of EUV Source Models: LLP | Martin Richardson, University of Central Florida | |
| Benchmarking of EUV Source Models: LLP | Katsunobu Nishihara, Osaka Univ. | |
| Standard Debris Measurements in EUV Sources | Shailendra Srivastava, University of Illinois at - Urbana Champaign | |
| Standard Absolute Measurements of Out-of-band Radiation in EUV Sources | Fergal O’Reilly, University College Dublin | |
| EUV Source Technology Status and EUV Source Workshop Summary | Vivek Bakshi, SEMATECH | |
Poster Session |
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| High Power Pulsed CO2 Laser for EUV Lithography | Akira Endo, Hideo Hoshino, Tatsuya Ariga, Taisuke Miura, EUVA | |
| High Power and High Repetition Nd: YAG Laser Pumped by CW LDs for EUV Lithography | Hisanori Fujita, Masahiro Nakatsuka, Tao Wang, Koji Tsubakimoto, Yasushi Fujimoto, Hidetsugu Yoshida, Noriaki Miyanaga, Yasukazu Izawa, Institute of Laser Engineering, Osaka University | |
| New efficient and durable EUV collector concept | Roland Geyl, SAGEM | |
| Multilayer Optic Fabrication | M.D. Kriese, J. Rodriguez and Y.Y. Platonov, Osmics | |
| Debris characterization and mitigation from a tin DPP and LPP EUV sources - Illinois Calibrated ESA's at work | S.N. Srivastava, Keith C. Thompson, Huatuan Qiu, Erik L. Antonsen, David N. Ruzic, Oran Morris, Paddy Hayden, Padraig Dunne, Plasma Material Interaction Group, University of Illinois at Urbana-Champaign | |
| Mitigation of fast ions from laser-produced Sn plasma for extreme ultraviolet lithography source | Y.Tao and M.S.Tillack, University of California, San Diego | |
| Benchmarkig of EUV Source Models: MPP Capillary Discharge Simulation with Z* Blackbox Modelling Engine | Sergey V. ZAKHAROV 1,+, Peter CHOI 1, Alexander Yu. KRUKOVSKIY 1, Vladimir G. NOVIKOV*, Vasily S. ZAKHAROV*, EPPRA sas, + also with RRC Kurchatov Institute, Moscow, Russia, * Keldysh Institute of Applied Mathematics RAS, Moscow, Russia | |
| Flow Z-Pinch EUV Light Source | Uri Shumlak, Brian Nelson, University of Washington, Aerospace & Energetics Research Program | |