| Welcome and Introduction |
Vivek Bakshi |
Technology Status Update |
|
| Update on Joint EUV Source Requirements |
Akira Miyake, Canon |
| EUV Source Technology Status Update |
Vivek Bakshi, SEMATECH |
Panel Discussion – EUV Sources for HVM |
| Panelist Questions/Logistics |
Mike Lercel, SEMATECH/IBM |
| Scanner Manufacturers: |
|
| |
ASML [pdf] |
Vadim Banine |
| |
Canon [pdf] |
Shigeyuki Uzawa |
| EUV Source Suppliers: |
|
 view video |
Cymer [pdf] |
Igor Fomenkov |
| view video |
EUVA [pdf] |
Akira Endo |
| view video |
Philips Extreme [pdf] |
Joseph Pankert |
| view video |
Xtreme technologies [pdf] |
Uwe Stamm |
Panel Discussion – EUV Sources for HVM |
|
| End Users: |
|
| view video |
AMD [pdf] |
Obert Wood |
| view video |
IBM [pdf] |
Kurt Kimmel |
| view video |
Intel [pdf] |
Yashesh Shroff |
| view video |
NXP [pdf] |
Mart Graef |
| view video |
Qimonda [pdf] |
Frank Goodwin |
| view video |
Selete [pdf] |
Ichiro Mori |
| view video |
STM [pdf] |
Paolo Canestrari |
| view video |
Toshiba [pdf] |
Tatsuhiko Higashiki |
Debris Mitigation Technology |
|
| Plasma Debris Interaction with Mitigation and Collector Systems |
A. Hassanein, ANL |
| Collector Lifetime and Debris Specifications |
David Ruzic, UIUC |
| Present and Future of EUV Collector Technology |
Valentino Rigato, Media Lario |
| Near Normal Incidence Collector for Easier and More Efficient Debris Mitigation |
Roland Geyl, Sagem |
Future Generation EUV Sources: FEL Based EUV Sources |
|
| Compact FEL Applications for EUV Lithography |
Michael Goldstein, Intel |
| Laser Readiness for all Optical EUV FEL |
Akira Endo, EUVA |
| Free Electron Laser as a Potential Source for EUV Lithography |
M.V. Yurkov, DESY |
| Laser Seeded FEL R&D at the NSLS SDL and Its Potential Application for the EUV Generation |
X. J. Wang, BNL |
Future Generation EUV Sources: New Concepts |
|
| Micro Discharge-Array Based EUV Sources |
Brian Jurczyk, Starfire Industries |
| Some Aspects of ISAN/ASML Prototype DPP EUV Source |
Konstantin Koshelev, ISAN |
| EUV Source Multiplexing |
Michael Goldstein, Intel |
| Fiber Laser Based EUV Sources |
Almantas Galvanskus, University of Michigan |
| Update on Mass Limited Sn LPP Performance |
Martin Richardson, UCF |
EUV Metrology Benchmarking |
|
| Beamline Benchmarking |
Vivek Bakshi, SEMATECH |
| Benchmarking Absolute Out of Band, OOB Measurements |
Padraig Dunne, UCD |
EUV Source Modeling Benchmarking |
|
| Benchmarking of HEIGHTS Simulation against LPP and DPP Discharge Experiments |
A. Hassanein, ANL |
| Japanese Update on Sn LPP Benchmarking |
Atsushi Sunahara, University of Osaka |
| Update on EUV Source Modeling Benchmarking |
Sergey Zakharov, EPPRA |
| Status of Modeling Benchmarking |
Katsunobu Nishihara, University of Osaka |
| |
|
| EUV Source Workshop Summary |
Vivek Bakshi, SEMATECH |
Posters |
|
| Debris Characterization, Mitigation and Cleaning from Tin EUV Sources: Steps Toward Establishing a Standard |
Shailendra Srivastava, University of Illinois at Urbana-Champaign |
| Minimization of Debris in Double-Pulse Laser-Produced Plasmas |
M. S. Tillack, University of California, San Diego |
| A Plasma Ion Source Test Facility for Accelerated EUVL Optics Life Time Experiments |
M. R. Akdim, FOM-Institute for Plasma Physics Rijnhuizen |
| Free Electron Laser in Hamburg (FLASH) |
E.L. Saldin, DESY |
| The European X-Ray Free-Electron Laser Project |
H. Weise, DESY |
| A Multi-kW EUV Light Source Driven by Energy-Recovery Linac |
Eisuke Minehara, Japan Atomic Energy Agency (JAEA) |
| A Compact X-Band High Gradient Photoinjector and Accelerator for Compton Scattering |
Christopher DeStefano, University of California Davis |
| Development of pulsed-laser stacking cavity for EUV source |
Kazuyuki Sakaue, Waseda University |
| Progress and Perspectives of Tin-Doped Droplet Laser Plasma EUVL Sources for HVM |
Kazutoshi Takenoshita, University of Central Florida |
| Progressing Modeling with Z* Blackbox Modeling Engine of LPP, Laser Induced DPP and Hollow Cathode Micro Plasma Pulsed EUV Sources |
Sergey Zakharov, EPPRA sas |
| Performance Update on the Multiplexed Micro Plasma Pulse EUV Source |
Sergey Zakharov, EPPRA sas |
| High Efficiency SPF Filters for EUVL |
Leonid Shmaenok, PhysTex |
| OOB Reflectivity Measurements of EUV Source Collector Materials |
Vivek Bakshi, SEMATECH |
| Experimental validation of collector's thermo-optical design |
Fabio Zocchi, Media Lario |