Exposure Tools |
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| Comparison
of Extreme Ultra-Violet Interference Lithography Optical Designs for
Photoresist Research |
Michael
Goldstein |
Intel |
| First EUV
Contact Lithography Experiments for the Coloration of Lithium Fluoride |
Francesco Flora |
ENEA |
| The Italian
National FIRB Project on EUV Lithography |
A.
Reale-d |
ENEA-CR
Frascati |
| Study on
Photo-Chemical Analysis System for EUV Lithography |
A.Sekiguchi |
Lith
Tech Japan Corp. |
| Design for a
Stand-Alone Extreme Ultraviolet Interference Lithography Tool |
Patrick
Naulleau |
LBNL |
Source |
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| Low-Debris, EUV
Source Using a Colloidal Microjet Target Containing Tin Dioxide Nanoparticles |
Shoichi
Kubodera |
University
of Miyazaki |
| Optimization of
13.5 nm Conversion Efficiencies for LPP and DPP EUVL Radiation Sources |
Joseph
J. MacFarlane |
Prism
Computational Sciences, Inc. |
| Development of a
Gas Jet-Type Z Pinch EUV Light Source for Lithography |
Naoya
Iizuka |
Tokyo
Institute of Technology |
| Laser
and Target Optimization for the Highest Conversion to 13.5 nm EUV Light with
Laser Produced, Minimum-Mass Tin Plasma |
Hiroaki
Nishimura |
Osaka
University
Institute for Laser Technology |
| Modeling of the
Atomic Processes in EUVL Source Plasmas |
Akira.
Sasaki |
Japan
Atomic Energy |
| RZLine MHD Model
of Z-Pinch Discharge Based EUV Source |
V.
Ivanov |
ISAN |
| Characterization
of Debris Mitigation Techniques for a Sn and Ze-fueled DPP EUV Light Source |
Keith
Thompson |
University
Ill Urbana-Champaign |
| Temperature and
Density Measurement of Laser-Produced EUV Plasmas |
Tatsuya
Aota |
Osaka
University
Institute for Laser Technology |
| Emission
Characteristics of Neutral Atoms and Ions of Laser-Produced Tin Plasma |
Akihiko
Takahashi |
Kyushu
University |
| EUV Emission
Spectra of Charge-Selected Sn Ions in Charge Exchange Spectroscopy |
Hajime
Tanuma |
Japan Atomic
Energy
Tokyo Metropolitan U. |
| Development of
High-peak, High-Average LD Pumped Solid-State Laser System for EUV Generation |
Koji
Tsubakimoto |
Osaka
University |
| LPP-EUV Sources
Using Cryogenic Xe and Lithium New Scheme Targets |
Sho
Amano |
Hyogo
University |
| Development of
Low-Density Target for High Efficient EUV Generation |
Keiji
Nagai |
Osaka
University |
| Theoretical
Guidelines of LPP-EUV Sources for HVM |
Katsunobu
Nishihara |
Osaka
University |
| Analysis of the
Effects of a Small Area Magnetic Field for the Mitigation of the Debris
Emitted by a Laser Plasma Source |
Daniel
Amodio |
ENEA |
| Industrial
Kilowatt-Class Laser Modules in Scaling Up Laser Produced Plasmas (LPP) EUV
Source |
Samir
Ellwi |
Powerlase |
| Latest
Development of EUV-Sources for Flexible Laboratory Use |
Rainer
Lebert |
AIXUV
GmbH |
| Characterization
of Ionic Debris Interaction with a Buffer Gas in the Frame of Debris
Mitigation Issues. |
Sarah Bollanti |
ENEA |
| Systematics of
Atomic 4d-4f Transitions of Atomic Ions in EUVL Source Plasmas and
Neighboring Atomic Numbers |
Fumihiro
Koike |
Kitasato
University |
| In-situ EUV
reflectivity of Ru, Pd and Rh single-layer mirrors exposed to energetic and
thermal Sn |
J.P.
Allain |
Argonne
National Laboratory |
| LPP Source
System Development Results |
Igor
V. Fomenkov |
Cymer |
| Potentiality of
Magnetically Confined Plasma as an Efficient Extreme Ultraviolet Source |
Kazuhiko
Horioka |
Tokyo
Institute of Technology |
| Radiation
Hydrodynamic Simulation for LPP EUV Sources |
Atsushi
Sunahara |
Institute
for Laser Technology |
| Tin Material
Consumption and the Mirror Lifetime for Droplet Laser Plasma Sources |
Kazutoshi
Takenoshita |
UCF |
| Toward HVM
Conditions with the Tin-Doped Droplet Laser Plasma Source |
M.
Richardson |
UCF |
| Mitigation
Schemes for the Tin-Doped Droplet Target |
Tobias
Schmid |
UCF |
| Out-of-Band
Spectroscopy of the Tin Droplet Target |
Simi
A. George |
UCF |
| Microdischarge
Array for Advanced EUVL Illumination |
Brian
E. Jurczyk |
Starfire
Industries |
| One Watt EUV
Production by 80cm Outer Diameter Tabletop Synchrotron MIORCLE-20SX |
Hironari
Yamada |
Ritsumeikan
University |
| EUV Source
Development Using High-Current Pulsed Power Generator |
Nobuaki
Oshima |
Nagaoka
University |
| Angle-Resolved
Absolute Out-of-Band Radiation Studies of Tin-Based LPP Sources |
O.
Morris |
Universiy
College Dublin |
| Axial Dynamics
of Z-pinch Plasmas Driven by 100 ns-Long Current Pulses |
Sunao
Katsuki |
Kumamoto
University |
| Sn Cleaning of
Multi-Layer Mirrors with Hydrogen Radicals |
Maarten
van Herpen |
Philips
Research, ASML |
| Present Status
of Laser-Produced Plasma EUV Light Source |
Akira
Endo |
EUVA |
| Small Field
Exposure Tool (SFET) Light Source Status |
Tamotsu
Abe |
EUVA |
| Calculation of
Sn and Xe Emission Spectra in Discharge Devices: the Influence of
Reabsorption in Spectral Lines |
Vladimir
G. Novikov |
Keldysh
Institue of Applied Mathematics
ISAN |
| Dynamical
Orbital Collapse Drives Super Xe(M) X-Ray Emission at Lambda ~12-14 Å for
Lithographic Applications |
Charles Kirkham Rhodes |
University
of Illinois at Chicago |
| Influence of configuration interaction on satellite lines and on emission of EUV plasmas |
Francois de Gaufridy de Dortan |
CEA-LETI |
| Strongly Multiplexed Micro Plasma Pulse EUV Source with Non-Destructive EUV Radiation Collimating-Focusing Structure |
Sergey Zakharov |
EPPRA |
Resist |
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| The
Development of EUV Resists Based on Non-polymeric Macromolecules with
Polyphenol Derivatives |
Masatoshi
Echigo |
Mitsubishi
Gas Chemical |
| Chemical
Force Microscopy for Imaging Chemical Distributions in Undeveloped
Resists |
John
T. Woodward |
NIST |
| UV Resist Tuning
for EUV Application |
Doohoon
Goo |
ASET |
| Development of
Novel Resist Polymers for EUV Lithography |
Takashi
Sasaki |
Asahi
Glass |
| Distribution
Control of Protecting Groups and its Effect on LER for EUV Molecular Resist |
Daiju
Shiono |
TOK |
| Tools for
EUV-Resist Characterization |
Rainer
Lebert |
AIXUV
GmbH |
| Chemically-Amplified
Negative-Tone Molecular Resist using Polarity Change Reaction for EUVL |
Kyoko
Kojima |
Hitachi
Ltd |
| Resist
Outgassing and Exposure Using the Energetiq EQ-10 Electrodeless Z-Pinch EUV
Light Source |
Paul A. Blackborow |
Energetiq
Technology |
| Effect of
Photoacid Generator Concentration on the Performance of a Model EUV
Photoresist |
Eric K. Lin |
Intel |
| Evaluation of
Molecular Glass Performance for 32nm Resolution and Beyond |
Damien Djian |
CEA-LETI |
| Comparison of
EUV Resists Out-Gassing Under Continuous vs Pulsed Illumination |
Julia
Simon |
CEA-LETI |
| Study of Extreme
Ultra-Violet Photoresist Quality for 32nm Pattern Formation |
Eun-Jin
Kim |
Hanyang
University |
| Anionic PAG
Bound Photoresists for EUV |
Mingxing
Wang |
University
of North Carolina, Charlotte |
| Critical Issues
of EUV Resists and New Research Approach |
S.Tagawa |
Osaka
University |
| Acid Generation
in Chemically Amplified EUV Resists |
T.
Kozawa |
Osaka
University |
| Exposure Dose
Dependence on LER of Latent Image in EB/EUV Lithographies Studied by Monte
Carlo Technique |
Akinori
Saeki |
Osaka
University |
| Polymer
Structure Dependence of Acid Generation in Chemically Amplified EUV Resists |
Hiroki
Yamamoto |
Osaka
University |
| Thermodynamic
Analysis of Acid Amplifiers for EUV Lithography |
Robert
Brainard |
University
Albany |
| EUV Resists
Limits - New Screening Results |
Wolf-Dieter
Domke |
Qimonda |
| EUV Resist
Outgassing Round Robin Results |
Kim
R. Dean |
SEMATECH |
| Novel Method to Quantify Resist Outgassing Induced Contamination Rates |
Annemieke van de Runstraat |
TNO Science and Industry, Delft, The Netherlands |
Mask |
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| Evaluation of
EUV Scatterometry for CD Characterization of EUV Masks Using Rigorous
FEM-Simulation |
Frank
Scholze |
Physikalisch-Technische
Bundesanstalt |
| Etching
Characteristics of Multi-Stack EUVL Mask Structure Using Inductively Coupled
Plasma |
Moon-Soo
Park |
Sungkyunkwan
University |
| Fidelity of
Rectangular Patterns Printed with 0.3-NA MET Optics. |
Yuusuke
Tanaka |
ASET |
| At Wavelength
Measurements and Study of EUV Low Topology Phase Shift Masks |
Marieke
Richard |
CEA-LETI |
| Development of
Low Thermal Expansion Materials and CTE Measurement Tool for EUVL |
Yasutomi
Iwahashi |
Asahi
Glass |
| Improvements
made to Corning ULE @ Glass to Meeting P-37 Specifications |
William
Rosch |
Corning
Inc. |
| Development of
Low Defect Glass Substrate for EUVL |
Mika
Yokoyama |
Asahi
Glass |
| Effects of EUV
Dry Etch Process on Image Placement (IP) Errors |
Hoon
Kim |
Samsung |
| EUV
Reflectometer for EUV Lithography |
Sung
Yong Cho |
Samsung |
| EUV Absorber /
Buffer Etch Variability Investigation |
Pavel
Nesladek |
AMTC |
| Evaluation of
TaSix Absorber Stack with a Novel Buffer for EUVL Mask |
Shinpei
Tamura |
Toppan
Printing |
| Defect Repair of
EUV Absorber Layer Using Low Acceleration Voltage FIB-GAE |
Tsukasa
Abe |
Dai
Nippon Printing |
| Characteristics
of Ru Capping and Optimization of EUV Mask Absorber Stack |
Seung
Yoon Lee |
Hanyang
University |
| Development and
Evaluation of EUV Mask Substrates |
Shouji
Shimojima |
Hoya
Corporation |
| Flatness
Response of an EUV Mask during Exposure Chucking |
Madhura
Nataraju |
University
of Wisconsin |
Metrology |
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| At-Wavelength
Reflectometry with the EUV Tube |
Andrew
Egbert |
phoenix-euv
Systems + Services GmbH |
| Results from our
Recently Delivered Automated Reflectometer for Measurement of Reflectivity of
EUV Lithography Masks |
Rupert
C. Perera |
EUV
Technology |
| Compact EUV
Source and Optics System for Metrology and Material Interaction Studies |
Christian
Peth |
Laser-Laboratorium
Goettingen |
| At-Wavelength
Evaluation of Multilayer Mirrors for EUV Lithography |
Fumitaro
Masaki |
Canon,
Inc. |
| Precise and Compact EUV
Reflectometer |
Ulf
Hinze |
Laser
Zentrum Hannover e.V. |
| Design of
Multilayer Mirrors for Metrology of EUV Sources |
F. Bijkerk |
Institute
for Crystallography |
| AIXUV's Tools
for EUV-Reflectometry |
Christian Wies |
AIXUV
GmbH |
| Test Stand for
Optical Characterization of Grazing Incidence Collectors |
Klaus
Bergmann |
Fraunhofer |
Contamination
& Cleanliness |
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| High
Acceleration Test for Contamination of Ru Capping Layers for EUVL Projection
Optics Mirrors |
Yukinobu
Kakutani |
University
of Hyogo |
| In
situ XANES Analysis for EUVL Projection Optics Contamination |
Masahito
Niibe |
University
of Hyogo |
| Thermal- and
Electron-Induced Reactions on the Ru(10-10) Surface: Relevance to Extreme
Ultraviolet Lithography |
Boris
V. Yakshinskiy |
Rutgers
University |
| Effect of
Deposition, Sputtering, and Evaporation of Lithium Debris Buildup on EUV
Optics |
Martin
Neumann |
University
Ill Urbana- Champaign |
| Gibbsian
Segregating Alloys Driven by Thermal and Ion Flux Gradients |
Huatan
Qiu |
University
Ill Urbana-Champaign (UIUC) |
| Selective
Etching of Sn from Ru EUV Mirrors with Ar/C12 Plasma |
Hyungjoo
Shin |
University
Ill Urbana-Champaign (UIUC) |
| Plasma Cleaning
of Multilayer Coatings from Carbon and Tin Contaminations |
Lopaev D.V. |
ISAN |
| Plasma-Assisted
Electrostatic Cleaning of EUV Masks |
Wayne
M. Lytle |
University
of Ill at Urbana-Champaign |
| Study of
Contamination of Mo/Si Multilayer Mirrors in Water and Hydrocarbon
Environment under Controlled Vacuum Conditions |
Rashi
Garg |
U
Albany |
| Effect of
Current Processes on PRE, Damage, and Reflectance of EUV Mask |
Jaehyuck
Choi |
Samsung |
| Debris
Mitigation and Cleaning for Sn-Fueled EUV Source |
Takahiro
Shirai |
Ushio |
| Managing the
Vacuum Environment of a Source-Collector Module |
Carolyn
Hughes |
BOC
Edwards |
| Contamination
Control in the Projection Optics Environment |
Anthony
Keen |
BOC
Edwards |
| Progress in the Optics Lifetime Programme for ASML EUV Lithographic Tools |
Bas Wolschrijn |
TNO Science and Industry, Delft, The Netherlands |
Defect Inspection |
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| Impact
of Imaging Optics Quality on Actinic Mask Blank Inspection |
Yoshihiro
Tezuka |
MIRAI-ASET |
| Imaging
Characteristics of Dark-Field Actinic Mask Blank Inspection |
Tsuneo
Terasawa |
MIRAI-ASET |
| EUV Microspopy
for Defect Inspection |
Larissa
Juschkin |
RWTH
Aachen Univ. |
| The Capability
of Recent DUV Inspection and Printability for Pattern Defects on EUV Mask in
45nm Node and Below |
Do
Young Kim |
Samsung |
Multilayer Coatings
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| Advanced Process
for Mo-Si Multilayer Formation using an Assisted Ion Beam for EUVL Mask
Blanks |
Kenji
Hiruma |
ASET |
| Evaluation of
Magnetron Sputter Deposition as Multilayer Coating Technology for EUVL
Projection Optics |
Stefan
Braun |
Fraunhofer
Institut |
| Dual Ion Beam
Sputter Deposition for EUVL Optics: Large Area and High Reflectance |
Stefan
Braun |
Fraunhofer
Institut |
| Wideband
Multilayer Mirrors for EUV Optical Systems |
E. Louis |
Institute
for Crystallography |
| Multilayer
Coatings Development for Non-Radial Gradients on Aspherical Optics |
Michael
D. Kriese & Yuriy Y. Platonov |
Rigaku
Innovative Technologies |
Optics |
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| IBF Technology
Development for EUVL Mirrors |
Manabu
Ando |
Canon,
Inc. |
| Analysis
of Relation between Resist LER and Optical Condition of Exposure Tool in EUV
Lithography |
Yukiko
Kikuchi |
ASET |
| Interface
Engineering of Mo/Si Multilayers for Enhanced Reflectance in EUVL
Applications |
A.E.
Yakshin |
FOM |
| Characterization
of Grazing Incidence Collectors Under Near Production Conditions |
Klaus
Bergmann |
Fraunhofer |
| Ultra Low
Thermal Expansion Material "CLEARCERAM®-Z" for EUVL Application |
Yoshiyuki
Owari |
Ohara,
Inc. |
| Demonstration of
an EUV Phase-Only Computer-Generated Hologram |
Patrick
Naulleau |
LBNL |
| The Effect of
Mask Background Density on Imaging Performance in EUV Lithography |
Jinhong
Park |
Samsung |
Reticle
Protection |
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| Effect of
Differential Pressure on Particle Contamination on EUVL Photomasks |
Christof
Asbach |
IUTA |
| Selete Mask
Handling Program |
Kazuya Ota |
Selete |
| A Short-Pulsed
Laser Cleaning System for EUVL Tool |
Masami
Yonekawa |
Canon,
Inc. |
Sensors and Diagnostics
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| Monitoring
Optics Contamination |
M.H.L.
van der Velden |
Eindhoven
Univ of Technology |