| Introduction |
Vivek Bakshi, SEMATECH |
Technology Update
|
|
| Cymer |
David Brandt, Cymer |
| Gigaphoton |
Hakaru Mizoguchi, Gigaphoton |
| Philips Extreme UV |
Marc Corthout, Philips Extreme UV |
| Xtreme technologies |
Uwe Stamm, Xtreme technologies |
Panel Discussion
|
 view video |
Introductions |
Vivek Bakshi, SEMATECH (moderator) |
| view video |
Canon |
Akira Miyake, Canon |
| view video |
Nikon |
Katshuhiko Murakami, Nikon |
| view video |
AMD |
Obert Wood, AMD |
| view video |
IBM |
Kurt Kimmel, IBM |
| view video |
Intel |
Yashesh Shroff, Intel |
| view video |
Cymer |
Igor Fomenkov, Cymer |
| view video |
Gigaphoton |
Hakaru Mizoguchi, Gigaphoton |
| view video |
Philips Extreme UV |
Marc Corthout, Philips Extreme UV |
| view video |
Xtreme technologies |
Uwe Stamm, Xtreme technologies |
| view video |
Media Lario |
Konrad Knapp, Media Lario |
High Power CO2 Lasers
| |
| Coherent |
Eric Mueller, Coherent |
| Cymer |
Igor Fomenkov, Cymer |
| EUVA | Akira Endo, EUVA |
| Report Out: High Power CO2 Lasers |
Eric Mueller, Coherent / Kurt Weingarten, Time-Bandwidth Products, Inc. |
High Power Nd: YAG Lasers
| |
| Powerlase |
Samir Ellwi, Powerlase |
| Fraunhofer - Aachen / Edgewave |
Dieter Hoffman, Fraunhofer - Aachen / Edgewave |
| Osaka University |
Hisanori Fujita, Osaka University |
| Japan Atomic Energy / Agency |
Hiromitsu Kiriyama, Japan Atomic Energy Agency |
| Report Out: High Power Nd: YAG lasers |
Samir Ellwi, Powerlase / Hiromitsu Kiriyama, Japan Atomic Energy Agency |
High Power Fiber Based Lasers
| |
| Aculight Seattle |
Fabio Di Teodoro, Aculight Seattle |
| Fraunhofer Institute Jena |
Jens Limpert, Fraunhofer Institute Jena |
| University of Central Florida |
Martin Richardson, University of Central Florida |
| University of Michigan |
Almantas Galvanauskas, University of Michigan |
| Report Out: High Power fiber based lasers |
Fabio Di Teodoro, Aculight Corporation / Almantas Galvanauskas, University Michigan |
Technical Presentations
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| Temporal and Spatial Multiplexing Approaching for LLP | Martin Richardson , University of Central Florida |
| Modeling with the Code Z* of EUV Emmision and Fast Particles Generation in DPP and LPP Sources | Sergey Zakarov, EPPRA |
| Review of Tin Debris Mitigation Technology Status and Future Challenges (LPP/DPP) | David Ruziz, University of Illinious Urbana Champaign |
| Update of EUV Source Requirements and EUV Source Workshop Summary | Vivek Bakshi, SEMATECH |
Posters |
|
| Development of High Power and High Repetition Solid State Lasers for EUV Lithography |
Hisanori Fujita, Masahiro Nakatsuka, Ravi Bhushan, Koji Tsubakimoto, Yasushi Fujimoto, Hidetsugu Yoshida, Noriaki Miyanage, and Yasukazu Izawa, Institute of Laser Engineering, Osaka University |
| Frequency converted short pulse fiber lasers as potential seed source for CO2 regenerative for amplifiers |
J. Limpert, A. Tunnermann, A. Endo, Friedrich Schiller University, Institute of Applied Science, GigaPhoton |
| Amplification of 10-nsec laser pulses in CO2 slab amplifiers |
N. A. Romanov, T. Ariga, A. I. Dutov, A. Endo, D.A. Goryachkin, V. M. Irtuganov, V.P. Kalinin, A. A. Kulshov, N. A. Orlov, A. Yu Rodionov, V.V. Sergeev, V. E. Sherstobitoy, A. A. Smirnov, A. A. Sokolov, E. A. Zoboy, Institute of Laser Physics, St. Petersburg, Russia, EUVA, Hiratsuka R&D Center |
| Scaling of short pulse CO2 laser in multi 10 kW output power |
Akira Endo, Hideo Hoshino, Takeshi Asayama, Takashi Suganuma, Tatsuya Ariga, Masato Moriya, Tamotsu Abe, Hiroshi Komori, Akira Sumitani, Hakaru Mizoguchi, EUVA |
| Evaluation of Xe and Sn droplets as LPP targets |
Takashi Suganuma, Takayuki Yabu, Masaki Nakano, Hiroshi Someya, Yoshifumi Ueno, Georg Soumagne, Tamotsu Abe, Hiroshi Komori, Akira Sumitani, Akira Endo, EUVA |
| Combined YAG-CO2 Laser Produced Plasma EUV Source Examination with the Code Z* |
Georg Soumagne, Sergey V, Zakharov, Peter Choi, Vladimir G. Novikov, Vasily S. Zakharov, Akira Sumitani, EUVA, EPPRA, RRC Kurchatov Institute, Keldysh Institute of Applied Mathematics |
| Further Improvement of Conversion Efficiency and Mitigation of Fast Ions by Magnetic Field |
K. Nishihara, M. Murakami, M. Numata, A. Sunahara, A. Takata, H. Ueda, Osaka University, Advance Photon Research Center |
| Fast Particles in Transient Plasmas and Debris of DPP EUV Sources Modeling with the code Z* |
Sergey Zakarov, Andrey Berezin, Vladimir Novikov, EPPRA, RRC Kurchatov Institute, Keldysh Institute of Applied Mathematics |
| Tin removal from EUV collector optics by reactive ion etching |
S. N. Srivastava, Hyungjoo Shin, D. N. Ruzic, Center for Plasma Material Interactions, University of Illinois at Urbana-Champaign |
| ACR-based EUV radiometry at NIST |
S. Grantham, R.E. Vest & C. Tarrio, NIST |
| Roadmap for facility systems to support EUVL |
Phil Naughton, ISMI |