SEMATECH Mask Cleaning Workshop

October 6, 2008
Monterey, CA

	Download Workshop Proceedings (8 Mb PDF)
KEYNOTE: Cavitation Bubble Dynamics	Christopher. E. Brennen, Caltech
KEYNOTE: Molecular Contamination and its Potential Impact On and Below Photomask Surface	Brian J. Grenon, Grenon Consulting Inc
Lifetime of EUVL masks	Sungmin Huh, Samsung/SEMATECH
Unique Challenges and their possible solutions in EUV mask Cleaning	Takeya Shiomura, DNP
Role of mixed fluid Jet Droplet Characteristics in advanced photomask cleaning	Tong Liu, Applied Materials
CO2 Cryogenic Aerosol Technology for advanced mask cleaning	P. Cheng/Eco Systems
Challenges in PRE measurements	S. Eichenlaub, SEMATECH
High speed visualization of particle removal by megasonic bubbles	W. Kim, Seoul National University
Design and Measurement Consideration for Megasonic Cleaning	C. Zanelli, Onda Cop.
Impact of cleaning on surface structure of EUV substrates	A. Rastegar, SEMATECH
Cleaning and resist striping technologies for 32 nm node photomask fabrication	H.Ogawa, Sigmameltic
Effects of Filter and System Design on Particle Removal Efficiency in Typical Semiconductor Filtration Applications	A. Formeta, Entegris
Development status of EUVL mask Blank	K. Shiromo, AGC
Challenges in Advanced Mask Manufacturing and Cleaning	Henry Yun, SEMATECH