SEMATECH 7th Annual Mask Cleaning Workshop
September 13, 2010
Monterey, CA
Part 1 |
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| KEYNOTE: EUV Mask Cleaning: Progress and Issue | Naoya Hayashi, DNP |
| Investigation of Ozonated Water for Ruthenium-Capped EUV mask Cleaning | Seungho Lee, Hanyang University |
| The Power of Light- A Leap in Performance | Uwe Dietze, Suss (Hamatech) |
| Qualification of BitClean Technology in Photomask Production | Ron Bozak, RAVE N.P.Inc |
| EUV Mask and Blank Cleaning Requirement for 16nm HP node | Abbas Rastegar, SEMATECH |
Part 2 | Download PDF |
| CO2 Cryogenic Aerosol Technology Development for EUV Mask Cleaning & Restoration | Ivin Varghese, Eco-snow Systems, RAVE N.P. Inc |
| Acoustic Characterization of an Ultrasonic or Megasonic Cleaning System | Petrie Yam, ONDACorporation |
| KEYNOTE: EUV Actinic Inspection and Broad Review of Current EUV Mask Status | Kenneth Goldberg, Lawrence Berkeley National Laboratory |
| Lasertec EUV Tool Development Status | Ji Lee, Lasertec Corp. |
| Novel Method for EUV Blank Phase Defect Control Using Ultrashort Laser Technology-Concept & Feasibility | Guy Ben-Zvi, Carl Zeiss |
Part 3 |
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| Effect of GaN Thin Film Thickness on Particle Adhesion in Semiconductor Applications | Katie Smith, Purdue University |
| Time Dependent Defects and Atmospheric Storage of EUV masks | Oleg Kishkovich, Entegris |
| Influence of Mask Surface Roughness on EUV | Eun-jin Kim, Hanyang University |
| Overview on Carl Zeiss EUV Mask Tools Roadmap | Wolfgang Harnisch, Carl Zeiss |