EUV Lithography Source Workshop
29 October 2001
Matsue, Japan
(All presentations are in .PDF format)
- Agenda/Welcome
- A Source for EUV Lithography, ASML
(Jos Benschop)
- Requirement for EUV source from exposure
system design, Nikon (Katsuhiko Murakami)
- Development Status of a Dense Plasma
Focus EUV Source for Lithography, Cymer (Igor Fomenkov)
- Laser Produced Plasma for Production EUV
Lithography, TRW (Luis Espinoza)
- JMAR Laser-Plasma Source for EUV Lithography,
JMAR (Edmond Turcu)
- EUV Light Source Workshop, Gigaphoton
(Hakaru Mizoguchi)
- High Power EUV Sources for Lithography,
Xtreme (Uwe Stamm)
- Hollow Cathode Triggered Pinch Plasma
Source for EUV Lithography, Philips (Joseph Pankert)
- Sandia National Laboratory Presentation,
(Glen Kubiak)
- High Power Astron EUV Source, Plex
(Malcolm McGeoch)
- Extreme Ultraviolet Light, Innolite
(Bert Junno)
- Meeting Minutes