Reticle Handling Working Group Meeting

17 October 2002
Addison, Texas

(All presentations are in .PDF format)

• Agenda/Overview/Survey Results - Jerry Cullins/Thomas White, ISMT
• Thermophoretic Mask Protection - Lennie Klebanoff, Sandia National Laboratories
• Data Matrix Identification - Thomas White, ISMT
• Proposal for EUV Reticle Box Standardization - Mitsuru Hiura, Canon
• SEMI Standards for EUVL Masks - Scott Hector, Motorola, Inc.