| Workshop Introduction | Thomas White (ISMT) |
| Standards Session | |
| EUV Mask Standards Update | Scott Hector (ISMT) |
| EUV Mask Roadmap Draft | T. White |
| Mask Handling Session | |
| Mask Fiducials | Pei-yang Yan (Intel) |
| Data Matrix Mask Identification | T. White |
| Mask Layout Map | T. White |
| ISMT 2004 Plans | T. White |
| Mask Carrier Session | |
| Current Carrier Protection Benchmark Results | Jenny Wang & Ken Racette (IBM) |
| Incam-Alcatel Carrier Proposal | Magali Davenet (Alcatel) |
| New Carrier Materials | T. White |
| ASYST Carrier Vision | Ray Martin (ASYST) |
| Mask Blank Session | |
| Legendre Mode Analysis | Andrew Mikkelson (University of Wisconsin) |
| 4.0 mm Substrate Thickness Evaluation | A. Mikkelson |
| Mask Thickness Uniformity Requirement | Chris Walton (Lawrence Livermore National Laboratory) |
| Current Blanks Performance | Jan Cavelaars (ISMT Mask Blank Development Center) |
| Electrostatic Chucks for NGL Masks | Abid Khan (INVAX Technologies) |
| PERIS Inspection | David Adler (KLA-Tencor) |
| Mask Cleaning Session | |
| Mask Cleaning Mechanisms and Techniques | Abbas Rastegar (ISMT Mask Blank Development Center) |
| Laser Shock Cleaning | Ahmed Busnaina (Northeastern University) |
| Breakout Summaries | |
| Metrology, Mask Flatness, Mask Carrier | |
| Workshop Close |
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