SEMI EUV Masks Standards Meeting

13 July 2004

[All linked files are .PDF format unless otherwise indicated]

Introduction	Thomas White (ISMT/AMD)
SEMI Required Elements
Review of February 2004 EUV Mask Workshop	T. White
Standards Update	Scott Hector (ISMT/Freescale)
Effect of Electrostatic Chucking and Substrate Thickness Uniformity on EUVL Mask Flatness	Roxann Englestad (University of Wisconsin)
IEUVI Mask Improvement Roadmap Draft	T. White
EUV Mask Automated Identification Using Data Matrix Standard Draft	(not available; SEMI will post the official blue ballot on its website)
EUV Mask Layout - Handling Area Proposals	T. White
Meeting minutes