EUV Mask Workshop

01 November 2004

[All linked files are .PDF format unless otherwise indicated]

Welcome/Agenda	Seidel
Japan regional update	Nishiyama
Challenges of EUV masks and preliminary evaluation	Hayashi
SEMATECH Mask Blank Development Center Update	Krick
Update on SEMI standards for EUV masks	Hector
Modeling of mask chucking and flatness errors	Engelstad
Defectivity progress and roadmaps	Seidel
Removable pellicle and protection methods and reticle handling activities at Intel	Ramamoorthy
Mask handling activities in Europe	Peters
Mask handling standards	Hector
Alcatel / Incam Carrier Concepts	Fay
Hakuto mask carrier activities	Umeda
Lasertec proposal for mask frame	Tamura
ASML mask handling concepts	Harned
A New Concept of EUV Reticle Particle Protection in Handling, and New Carrier Standard Proposal	Ota
Breakout 1: Mask enclosure domain and mask carrier proposals–what's the right approach?
Breakout 2: Wafer fab strategy–when does the mask go bad?