EUV Mask Workshop
28 February 2005

(All files are in PDF format unless otherwise indicated)

Introduction, Agenda, and Meeting Goals
Seidel

SEMI Standards Processes and EUV mask overview
Hector / Seidel

SEMATECH Standards preliminary survey results
Ramamoorthy

ASML position & proposals
Blum

Nikon / Canon Joint position & proposals
Ota

Entegris position & proposals
Sumner

Alcatel Vacuum position & proposals
Davenet

Lasertec position & proposals
Jing-yu

Hitachi position & proposals
Matsuoka

Univeristy. of Minnesota developments/results
Pui

Sandia developments/results
Geller

SEMATECH Defect Control Program
Orvek

Meeting Minutes & Roll Ups
P. Seidel / L. He / K. Orvek / A. Ramamoorthy