| Agenda | |
| Welcome and Overview | Trybula |
| Resist Introduction | Conley |
| Leaching | LeSeur |
| Scintillation | Taylor |
| NM Efforts Incl Hyper NA | Raub |
| RIT microstepper efforts | Smith |
| New fluids-Conclusion | Conley |
| Fluids introduction | Grenville |
| Topology-Filling-Lens Loading-Index Impact | Nellis |
| Bubble creation-reduction | Kandlikar |
| Water for immersion litho | Switkes |
| Fluid Refractive Index Metrology | Burnett |
| Conclusion | Grenville |
| Exposure Tool Company Report | Nikon |
| Exposure Tool Company Report | Canon |
| Exposure Tool Company Report | ASML |
| Prospects for 157nm Immersion | Rothschild |
| Summary | Trybula |
| GRATEFUL Tradeoffs |
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