Mask Supply Workshop

01 October 2001
Monterrey, California

(All presentations are in .PDF format)

• Meeting Minutes
• Breakout Sessions
• Introduction
• Mask Industry Infrastructure
• Texas Instruments: TI's Perspectives
• IBM - Fab Perspective on Mask Cost and TAT
• TSMC: Mask Cost and Cycle Time Reduction
• DuPont Photomasks
• KLA-Tencor: Challenges for Advanced Reticle Defect Inspection / Mask Technology Switching Costs
• Unaxis: Photomask Dry Etch - Cost of Ownership Analysis
• Hoya: Cost and Cycle Time of Mask Materials
• Intel: Challenges of Mask Cost and Cycle Time