5TH International Workshop on High-Throughput Charged Particle Lithography

06-09 August 2001
Kauai, Hawaii

(All presentations are in .PDF format)

Presentations

• Opening Remarks
• Roadmap Acceleration & CPL Challenges
• EPL Evolution
• Microcolumn Multi-electron Beam Direct Write Lithography
• Recent Progress of ADVANTEST EBDW System
• Data Processing for Advanced Mask Making

Posters

• Positive & Negative Tone Mask Resist for E-Beam Exposure
• Cost of Technology Development & Impact of Technology Acceleration
• CD Measurement Technology using High Resolution DUV Optics
• Performance Data on the new LMS IPRO II
• 100kV Direct Write System for 4 to 40nm Features
• Will EPC be needed, or just OPC