2010 SEMATECH Knowledge Series

SEMATECH Knowledge Series (SKS) meetings are unique opportunities to focus on accelerating solutions for critical challenges in the semiconductor industry.

For details about upcoming SKS meetings, please see Upcoming Meetings and Conferences.

Lithography

SEMATECH Litho Forum - 2010

Faced with significant reductions in R&D expenditures and increasing technology demands, the challenge of staying on the current technology roadmap has never been greater. In order to continue the development of advanced lithography solutions and get them to market when needed, cost-effectiveness must be integrated at the design phase. The SEMATECH Litho Forum will provide lithography business and R&D professionals a better understanding of the technical, logistic and economic challenges associated with getting lithography solutions to market when needed. http://www.sematech.org/meetings/announcements/8898/

10-12 May 2010; New York, New York

SEMATECH Maskless Lithography and Multibeam Mask Writer Workshop

This workshop will review technical and business aspects of ML2 technologies in application to both direct wafer imaging and as a solution for high speed mask writers. The objective of the workshop is to develop an understanding of the current status and performance of these lithography systems, identify remaining challenges, and identify development, engineering and business gaps facing the implementation of ML2 or multibeam mask writing technology . The workshop, which will be held in association with the SEMATECH Litho Forum, is co-sponsored by SEMATECH, Leti, and TSMC.

10 May 2010; New York, New York

SEMATECH Advanced Mask Cleaning Workshop

This full-day workshop provides a forum for SEMATECH members, mask and wafer cleaning suppliers, and researchers to discuss advancements in technologies and solutions applicable to advanced mask cleaning and surface preparation challenges. Topics include sub-30nm particle removal, molecular contamination removal, mask inspection defect analysis, and environmental approaches to mask cleaning. Held in conjunction with the BACUS Conference.

September 2010 (exact date TBD); Monterey, California

2010 International Symposium on Extreme Ultraviolet Lithography

The EUVL Symposium is part of SEMATECH’s ongoing commitment to help mature the technology and infrastructure for extreme ultraviolet lithography (EUVL), including sources, masks, optics, resists, contamination control, and metrology to support EUVL pilot line manufacturing requirements. Hosted by Selete, EUVA, SEMATECH and IMEC.

17–20 October 2010; Kobe, Japan

2010 International Symposium on Lithography Extensions

The Lithography Extensions Symposium focuses on efforts to extend 193nm lithography to the 22nm half-pitch node and beyond. The primary emphasis will be placed on patterning processes that enable pitch division, techniques for improving process control, and on emerging technologies that will extend optical lithography. Hosted by SEMATECH in collaboration with IMEC and Selete, and co-located with the EUVL Symposium.

21–22 October 2010; Kobe, Japan

Advanced Technologies

SEMATECH Surface Preparation and Cleaning Conference

This conference—which brings together the leading researchers from the semiconductor industry and the university community—focuses on advanced wafer and mask cleaning and surface preparation technologies. Speakers and participants will explore current developments and ITRS challenges in wafer and mask cleaning, including wafer front-end, wafer back-end, advanced mask, and environment, safety and health issues for the 22nm node and beyond. http://www.sematech.org/meetings/spcc/

22-24 March 2010; Austin, Texas

SEMATECH Workshop on Stress Management for 3D ICs Using Through Silicon Vias

Copper-filled TSVs and wafers thinned to a few tens of microns modify the stress profiles in the silicon, and exacerbate the stresses introduced by tier-to-tier bonding and chip-package interactions. This workshop will bring together representatives from device manufacturers, electronic design automation suppliers, semiconductor assembly and test service providers, and the R&D community to develop a unified vision of a simulation based DFM flow for mechanical stress management for advanced TSV-based 3D products and reach consensus on a uniform design kit format and content. http://www.sematech.org/meetings/announcements/8946/

16 March 2010; Albany, New York

SEMATECH Workshop on Metrology for 3D Interconnect

Successful introduction of 3D interconnects will require that equipment suppliers and device manufacturers overcome the inherent challenges associated with measuring opaque films and high-aspect ratio features that dominate 3D architectures. Metrology for 3D architectures requires new techniques, revisiting and improving some older techniques, and breakthrough innovations to create new metrology tools. This workshop, held in conjunction with SEMICON West, focuses on how new and existing wafer metrology technologies can be utilized, modified or enhanced to measure and improve 3D interconnect processes..

July 2010 (exact date TBD); San Francisco, California

SEMATECH International Symposium on Advanced Gate Stack Technology

The focus of this year's annual symposium is "Functional Stacks for Logic and Memory Devices." The exploration of functional stacks for future (sub 22nm node) devices will include high-k/metal gate stacks for Si, SiGe, III-V high performance MOSFETs; metal/high-k/metal gate stacks for storage capacitors and resistive change memory; high-k/metal gate for flash memory; insulators and metals needed for high-performance NEMS and sensors; and magnetic material stacks needed for spin-based devices. The symposium will feature industry experts presenting their latest research in both invited and contributed talks, and a discussion panel of representatives from major semiconductor device makers, equipment makers, and academia.

(Exact date/location TBD)

Manufacturing

ISMI Manufacturing Weeks

This year’s ISMI Manufacturing Week in Austin now includes the ISMI AEC/APC Symposium, followed by the 7th Annual ISMI Symposium on Manufacturing Effectiveness, as well as an extensive variety of workshops and short courses focused on specific topics relevant to today’s semiconductor manufacturing challenges Additional information about the latest products, services and novel ideas for increasing profits can be found at the supplier exhibits throughout the week. Similar ISMI Manufacturing Week events will take place in Taiwan and Japan, in conjunction with the SEMATECH Symposia to be held this fall.

ISMI Manufacturing Week North America – 31 October-4 November 2010; Austin, Texas http://ismi.sematech.org/ismisymposium
ISMI Manufacturing Week Taiwan – 6-10 September 2010; Hsinchu, Taiwan
ISMI Manufacturing Week Japan – 13-15 September 2010; Tokyo, Japan

ISMI Symposium on Manufacturing Effectiveness

The ISMI Symposium on Manufacturing Effectiveness is the semiconductor industry’s most important events for exchanging ideas about real-time, cost-saving solutions to help improve manufacturing productivity. The 7th Annual Symposium will be held during ISMI Manufacturing Week (see above).

3-4 November 2010; Austin, Texas

ISMI AEC/APC Symposia

These symposia, focused on advanced equipment control and advanced process control (AEC/APC), bring IC manufacturers and suppliers together to accelerate the industry toward more efficient and more intelligent manufacturing through automated data-driven decision making.

10th European AEC/APC Conference (a partnership between Silicon Saxony and ISMI) – 28-30 April 2010; Sicily, Italy
ISMI AEC/APC Symposium North America (held during ISMI Manufacturing Week, see above) – 31 October-3 November 2010, Austin Texas
Joint Symposium of e-Manufacturing & Design Collaboration 2010 and AEC/APC-Asia 2010 (a partnership between TSIA and ISMI) – (exact date/location TBD)

ISMI Installed-base Equipment Series - 2010

This series of workshops will bring together integrated circuit (IC) manufacturers with original equipment manufacturers (OEMs) to discuss key productivity and cost issues associated with specific wafer fab equipment types. In addition, selected experts and alternate parts suppliers focused on the mature equipment market will be invited to present. IC manufacturers are invited to participate in the first day of each event to learn about solutions through the sharing of real fab experiences, including best known methods which can provide an immediately valuable impact on their fabs.
http://ismi.sematech.org/meetings/installedbase.htm

Thermal Equipment Workshop – 23 March 2010; Austin, Texas
Implant Equipment Workshop – 20 April 2010; Boston, Massachusetts
Additional Installed-base Equipment Workshops – (exact date/location TBD)

ISMI Next Generation Factory e-Manufacturing Workshops

Organized by ISMI with support from SEMI, these workshops will provide the vision, progress, and roadmap for next generation factories, as well as reports on enabling implementations and deployment experiences including the latest Interface A, equipment data quality/time synchronization, predictive maintenance, and Enhanced Equipment Quality Assurance (EEQA) requirements. These workshops provide an excellent opportunity to further align IC manufacturers and suppliers in their next generation factory and e-manufacturing implementation strategies as the semiconductor industry strives to continuously improve factory productivity.

Summer Workshop (held in conjunction with SEMICON West) – 15 July 2010; San Francisco, California
Winter Workshop (held in conjunction with SEMICON Japan) – 30 November 2010; Makuhari Messe, Chiba, Japan

Other Industry-wide Events

SEMATECH Symposia - 2010

Senior executives and managers from SEMATECH and ISMI will hold symposia in Taiwan and Japan, in conjunction with ISMI Manufacturing Week events, to present program updates and examples of how SEMATECH’s models for consortial R&D are accelerating the next technology revolution worldwide. Public sessions will focus on key technology, manufacturing, and business issues in today’s global semiconductor industry, with opportunities for networking; member-only sessions will be devoted to reviewing program activities, technology transfer, and member feedback.

SEMATECH Symposium Taiwan 2010 – 7 September 2010; Hsinchu, Taiwan
SEMATECH Symposium Japan 2010 – 15 September 2010; Tokyo, Japan

International Technology Roadmap for Semiconductors (ITRS) Conferences

The ITRS will be reviewed in 2010 for updates to the technology requirements tables and other key data. The ITRS public conferences offer technologists and strategists from the manufacturing and supplier communities the opportunity to participate in building the next ITRS by providing input to the working group teams of industry and research experts who revise the semiconductor industry Roadmap.

Summer Conference (held in conjunction with SEMICON West) – 14 July 2010; San Francisco, California
Winter Conference (held in conjunction with SEMICON Japan) – 3 December 2010; Makuhari Messe, Makuhari, Japan