APPENDIX B: Chemical Compounds Used in the Semiconductor Industry

acetone ([CH₃]₂ CO)

ammonia (NH₃)

ammonium (NH₄)

ammonium hydroxide (NH₄OH)

boron hexafluoride (B₂F₆)

boron trifluoride (BF₃)

borophosphosilicate glass (BPSG)

carbon dioxide (CO₂)

carbon monoxide (CO)

carbon tetrachloride (CCl₄)

carbon tetrafluoride (CF₄)

diborane (B₂H₆)

dichlorosilane (SiH₂Cl₂) - DCS

disilane (Si₂H₆)

ethane (C₂H₆)

ethanol (C₂H₅OH)

Freon® 11 (CCl₃F ) - trichlorofluoromethane

Freon® 14 (CF₄ ) -carbon tetrafluoride

Freon® 23 (CHF₃ ) - trifluoromethane

gallium arsenide (GaAs)

germane (GeH₄)

hexamethyldisilazane (HMDS)

hydrogen bromide (HBr)

hydrogen chloride (HCl)

hydrogen peroxide (H₂O₂)

hydrofluoric acid (HF)

isopropyl alcohol (CHOH) - isopropanol

methane (CH₄)

nitric acid (HNO₃)

nitrous oxide (N₂0)

phosphine (PH₃)

phosphoric acid (H₃PO₄)

phosphorous oxychloride (POCl₃)

potassium hydroxide (KOH)

silane (SiH₄)

silicon dioxide (SiO₂)

silicon nitride (Si₃N₄)

sulfuric acid (H₂SO₄)

tetraethoxysilane (TEOS)

tungsten hexafluoride (WF₆)

xylene (C₈H₁₀)