SEMATECH Research
SEMATECH conducts state-of-the-art research on the technical challenges and costs associated with developing new materials, processes, and equipment for semiconductor manufacturing. Advanced technology programs focus on immersion and EUV lithography, 3D architecture, and high-k materials and next-generation transistors.
The SEMATECH technology strategy can be summed up as follows:

2007 Focus Areas
Lithography
- Immersion lithography
- EUV lithography
- Mask infrastructure
- Alternative lithography
Materials
- Advanced gate stack
- CMOS extension
- Non-planar CMOS extension
- Memory
- 3D interconnect
Manufacturing
- 300mm Prime/450mm
- Fab productivity
- Equipment productivity
- Metrology
- Environment, Safety, and Health
For more detailed information about SEMATECH's recent activities, please see the SEMATECH Annual Report, or if you work for a SEMATECH member company see the Member Site for technical reports and program data.


